Low-fluorescence high temperature resistant drilling fluid
A technology for drilling fluid and high temperature resistance, applied in the field of drilling fluid, can solve the problem of high fluorescence level, and achieve the effects of good rheological performance, good use effect, and low high temperature and high pressure filtration loss.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0035] Material preparation: sodium bentonite, 3%; drilling fluid fluid loss reducer PAMS601, 1.2%; sulfomethyl phenolic resin, 4%; sulfonated lignite resin, 8%; didodecanylamine, 0.6%; sodium sulfite, 0.8%; fatty alcohol polyoxyethylene ether, 0.15%; sodium alkylbenzene sulfonate, 0.1%; the rest is water. The mass percentage of each component is 100%.
[0036] Base slurry preparation: Add water into the container, add sodium-based bentonite while stirring, continue stirring for 150 minutes, stop stirring, and put the container in a curing box at 24±1°C for 24 hours;
[0037] Drilling fluid preparation: Add drilling fluid fluid loss reducer PAMS601, sulfomethyl phenolic resin, sulfonated lignite resin, dodecylamine, sodium sulfite, and fatty alcohol polyoxyethylene to the sodium-based bentonite-based slurry after curing. For ether and sodium alkylbenzene sulfonate, stir for 30 minutes after each material is added, and then stir for 120 minutes at 12,000 rpm.
[0038] Evaluat...
Embodiment 2
[0045] Material preparation: sodium bentonite, 4%; drilling fluid fluid loss reducer PAMS601, 1.0%; sulfomethyl phenolic resin, 2.5%; sulfonated lignite resin, 5%; didodecanylamine, 0.8%; sodium sulfite, 0.8%; fatty alcohol polyoxyethylene ether, 0.15%; sodium alkylbenzene sulfonate, 0.1%; barite powder 8%; the rest is water, and the mass percentage of each component is 100%.
[0046] Base slurry preparation: Add water into the container, add sodium-based bentonite while stirring, continue stirring for 180 minutes, stop stirring, and put the container in a curing box at 24±1°C for 24 hours;
[0047] Drilling fluid preparation: Add drilling fluid fluid loss reducer PAMS601, sulfomethyl phenolic resin, sulfonated lignite resin, dodecylamine, sodium sulfite, and fatty alcohol polyoxyethylene to the sodium-based bentonite-based slurry after curing. Ether, sodium alkylbenzene sulfonate, and barite, stir for 40 minutes after each material is added, and then stir for 130 minutes at 10,...
Embodiment 3
[0054] Material preparation: sodium bentonite 4%, drilling fluid fluid loss reducer PAMS601, 1.0%; sulfomethyl phenolic resin, 3%; sulfonated lignite resin, 6%; didodecanylamine, 0.8%; sodium sulfite, 0.8% %; fatty alcohol polyoxyethylene ether, 0.15% g, sodium alkylbenzene sulfonate A-20, 0.15%; barite powder, 12%; the rest is water. The mass percentage of each component is 100%.
[0055] Base slurry preparation: Add water into the container, add sodium-based bentonite while stirring, continue stirring for 180 minutes, stop stirring, and put the container in a curing box at 24±1°C for 24 hours;
[0056] Drilling fluid preparation: Add drilling fluid fluid loss reducer PAMS601, sulfomethyl phenolic resin, sulfonated lignite resin, dodecylamine, sodium sulfite, and fatty alcohol polyoxyethylene to the sodium-based bentonite-based slurry after curing. Ether and sodium alkylbenzene sulfonate A-20, barite, add each material and stir for 40 minutes, after all are finished, then st...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
density | aaaaa | aaaaa |
density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com