Cleaning equipment for single crystal growth furnace chamber

Abstract

The invention discloses cleaning equipment for a single crystal growth furnace chamber, which comprises a foundation plate, a lifting component, a rotation component and a water spray-wash component, wherein the lifting component is assembled on the foundation plate, the rotation component is assembled on a lifting support of the lifting component, and the water spray-wash component is arranged on a telescopic axle of the rotation component. The cleaning equipment for the single crystal growth furnace chamber is mainly characterized in that: the cleaning equipment has a compact structure, canflexibly move, has an arm lever which can be bent, stretched, lifted and descended, and can circumferentially work for 360 degrees, force is applied in a balanced way, wiping is uniform, and the cleaning effect is excellent by being matched with the manner that the high-pressure water jet is sprayed from the top part toward five aspects. The cleaning equipment has a simple design, is easy to realize, and also can be widely applied in other equipment and environments with cleaning requirements.

Description

technical field [0001] The invention relates to mechanical equipment for cleaning the environment and facilities, in particular to a cleaning equipment for the inner cavity of a single crystal growth furnace. Background technique [0002] In the process of using a single crystal growth furnace, each furnace of polysilicon is used up, that is, a single crystal silicon rod is completed, and the furnace and the inner cavity of the furnace must be cleaned to prepare for the start of the next furnace. However, there is no special equipment for cleaning single crystal growth furnaces at present, and manual cleaning is generally used. Workers wear rain capes, hold mops, drill into the furnace with the opening facing downward, and lift the mop to wipe the inner wall of the furnace that is higher than themselves. Due to the need to look up at the work, it is inevitable that the face is covered with dirt, the arms are stiff, and the cleaning effect is not very satisfactory. In vi...

AI Technical Summary

Problems solved by technology

However, there is no special equipment for cleaning single crystal growth furnaces at present, and manual cleaning is generally used. Workers wear rain capes, hold mops, drill into the furnace with the opening facing downward, and lift the mop to wipe the inner wall of the furnace that is higher than themselves. Because you have to look up to work, your face will inevitably be covered with dirt, your arms will be stiff, and the cleaning effect will not be ideal

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