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Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture

An ultrasonic atomization and ultra-precision technology, applied in the field of ultra-precision polishing, can solve problems such as secondary damage of the processed crystal surface, and achieve the effect of ensuring global flattening processing, high surface accuracy, and processing requirements.

Active Publication Date: 2012-08-01
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to remove the surface micro-cuts and sub-surface damage produced by the single-point diamond flying cutting (SPDT) ultra-precision machining method, obtain a high-quality ideal crystal surface, and solve the problem of secondary damage to the processed crystal surface that may be caused by the addition of cleaning procedures in the polishing process , proposed a micro-nano deliquescent ultra-precision polishing process for large-scale soft and brittle functional crystal KDP components

Method used

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  • Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture
  • Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture
  • Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture

Examples

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Embodiment

[0027]Example: The clean and dry gas 2 of the compressed air source is filtered through a precision filter with a filtration accuracy of 0.01 μm, free of impurities and dust; the ultrasonic water mist generator has an ultrasonic oscillation frequency of 2.4 MHz, and generates water mist 3, which is fully mixed with the clean air source The relative humidity of the gas after mixing is detected by a hygrometer, and its relative humidity is controlled by adjusting the flow rate of clean gas and the amount of water mist generated; the relative humidity of the gas after mixing is controlled at 90%, and the flow rate is 10L / min; the polishing head presses 4 on the polished crystal 6 On the surface; the mixed clean moist gas passes through the central hole on the polishing pad 5, and the liquid droplets 8 in the moist gas contact the polished crystal; the part of the crystal surface that is in contact with the moist gas undergoes micro deliquescence, forming a Layer dissolution layer ...

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Abstract

The invention relates to a kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture, which is characterized by first utilizing ultrasound to product water mist, enabling the water mist to be mixed with dry air to form clean water mist air, pressing a polishing head on the crystal surface, introducing the clean water mist air, conducting micro hydrolysis on the portion of the crystal surface contacted with the moist air to form a dissolution layer, then rotating the polishing head, enabling a polishing mat to remove the high point dissolution layer, enabling a vacuum source to absorb surplus moist air, enabling the polishing head to conduct small area local polishing, ensuring polishing evenness in local areas and finally enabling a polishing tool to polish under control of a computer to achieve crystal surface overall situation planarization according to a dwell time function calculated by a material removing rate function R (r, theta) and removing quantity (x, y) of each point. The method does not use traditional polishing liquid, does not need to washing the crystal surface after polishing is finished and is a real damage-free micro-nano processing method due to the fact that no mechanical processing stress exists in the processing process.

Description

technical field [0001] The invention relates to an ultra-precision polishing method for a class of deliquescent crystal components, in particular to a water-soluble soft and brittle functional crystal KDP (potassium dihydrogen phosphate, KH 2 PO 4 ) polishing method. Background technique [0002] Due to their good optical properties, soft and brittle functional crystal materials are widely used in the field of modern technology. KDP (potassium dihydrogen phosphate) crystal is a typical representative of soft and brittle functional crystals soluble in water, and plays an irreplaceable role in inertial confinement fusion (ICF) as frequency doubling crystals and electro-optical switching elements. However, soft and brittle, easily soluble in water, and strong anisotropy make it an extremely difficult material to process. At present, domestic and foreign research institutes use single-point diamond tool flying cutting (SPDT) technology to obtain ultra-smooth surfaces. Howeve...

Claims

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Application Information

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IPC IPC(8): B24B1/04
Inventor 郭东明高航王旭康仁科张和平
Owner DALIAN UNIV OF TECH
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