Spin valve structure with electric field-adjustable magnetoresistance and preparation process thereof
A technology of electric field adjustment and preparation process, applied in the field of magnetic storage, which can solve the problems of low impedance value, large leakage conductance, and can only be observed at lower temperatures
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[0029] Based on the above structure, the applicant has grown a new spin valve structure using laser pulse deposition and magnetron sputtering systems:
[0030] Sample 1: BiFeO with multiferroic material 3 The antiferromagnetic layer is deposited on the substrate by laser pulse deposition, and then the spin valve is grown in situ by magnetron sputtering. The detailed preparation process of the above structure is: using Pt(111) / Ti / SiO 2 / Si substrate, Pt layer as the bottom electrode, the size is 10*10 (mm 2 ); Laser pulse deposition to grow a multiferroic antiferromagnetic layer, the laser energy is 300mJ, the frequency is 5Hz, the oxygen (99.99%) pressure during deposition is 0.8-10Pa, the temperature is 650-750℃, and the annealing oxygen pressure is 20-300Pa , The annealing time is 30 minutes; the magnetron sputtering growth spin valve structure, the background vacuum of the sputtering chamber is 2×10 -5 Pa, the pressure of argon gas (99.99%) during sputtering is 0.5 Pa, and the ...
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