Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device for enhancing uniformity of electron beam current

A technology of electron beam current and uniformity, which is applied in the field of space applications, can solve the problems of uniformity of electron beam current, deterioration, and poor performance of filaments that are prone to deformation, and achieve the effect of not easily deformed, uniform scattering, and improved uniformity

Active Publication Date: 2012-07-11
NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the defect that the equipment for generating scattered low-energy electron currents in the prior art has poor performance in terms of electron beam uniformity and the filament in the electron gun that generates scattered low-energy electron currents is prone to deformation, which makes the uniformity of electron beam currents worse, the present invention The purpose of the invention is to provide a device for enhancing the uniformity of electron beam current, in particular, it relates to a device for enhancing the uniformity of electron beam current emitted by a scattering type low-energy electron current generating device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for enhancing uniformity of electron beam current
  • Device for enhancing uniformity of electron beam current
  • Device for enhancing uniformity of electron beam current

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] In order to fully illustrate the characteristics of the present invention and the mode of carrying out the present invention, examples are given below.

[0017] In the scattering type low-energy electron gun 2, the diameter of the circular disc-shaped spiral filament 3 is 5mm, and the diameter of the circular asbestos seat 4 is 4mm. The filament 3 is fixed on the asbestos seat 4, and the electron scattering net 1 is placed 50 mm outside the emission hole of the electron gun 2. The diameter of the hole in the electron scattering net 1 is 0.1 mm, and the electron scattering net 1 is a metal copper grid. net, see figure 1 and figure 2 .

[0018] Select a circular area with a diameter of 200mm at the place where the electron beam of the electron gun 2 is ejected, and select 5 points uniformly distributed in the circular area as test points for testing, and use the center point as the basis point 1 for electron beam testing. For comparison of flow uniformity, the electro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a device for enhancing uniformity of electron beam current, and belongs to the technical field of space application. The device for enhancing the uniformity of the electron beam current is an electron scattering net, the electron scattering net is arranged at a position of 30 to 70 millimeters far from the emission port of equipment for generating scattered low-energy electron current, the diameter of pores in the electron scattering net is 0.1 to 0.5 millimeter, and the electron scattering net is made of metal material; and when the equipment of the scattered low-energy electron current is an electronic gun, a filament in the electronic gun is fixed on an asbestos seat through a holder. By using the electron scattering net, the scattering area of the electron beam current emitted by the equipment of the scattered low-energy electron current is enlarged, and the uniformity of the electron beam current is enhanced; and the filament of the electronic gun fixed by using the asbestos seat is not easy to deform.

Description

technical field [0001] The invention relates to a device for enhancing the uniformity of electron beam current, in particular to a device for enhancing the uniformity of electron beam current emitted by a scattering type low-energy electron current generating device, which belongs to the field of space application technology. Background technique [0002] With the continuous development of my country's space application technology, higher requirements are put forward for the reliability of space materials. The most effective way to evaluate the performance of space materials on the ground is to simulate the space environment, and conduct simulation tests in the simulated space environment to evaluate the performance of space materials. Because the space plasma charged environment will charge the materials on the surface of aircraft, satellites and other instruments operating in space, causing space electrostatic discharge (SESD), causing interference to sensitive electronic ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01J3/12H01J3/02
Inventor 柳青孔风连李存惠秦晓刚汤道坦陈益峰
Owner NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com