Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation methods of gold and silver embedded target and film thereof

A technology of inlaying targets and gold and silver, which is applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of complex melting and casting process, uneven composition of coating samples, and low utilization rate of precious metals in target materials. Overcome the effects of unstable film composition, dense and uniform film structure, and reduced target cost

Inactive Publication Date: 2012-11-14
ZHENGZHOU UNIV
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The melting and casting process of this method is complicated. For precious metals, the utilization rate of the target precious metal produced by this method is not high, and at the same time, there is a phenomenon that the composition of the coating sample is uneven due to deviations in the melting and casting process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation methods of gold and silver embedded target and film thereof
  • Preparation methods of gold and silver embedded target and film thereof
  • Preparation methods of gold and silver embedded target and film thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Example 1: Gold and silver mosaic target material and preparation method thereof

[0047] 1. First, use a silver target with a purity of 99.99% in a clean room to conduct a sputtering experiment in a magnetron sputtering device to accurately obtain the dimensions of its sputtering runway. During the sputtering process, record the difference between the sputtering runway when it glows and the sputtering runway under normal working conditions, and make statistical analysis. After the sputtering is completed, measure and calculate the precise size of the sputtering runway, and then determine the shape and area of ​​the groove on the silver target runway according to the composition of the gold-silver alloy film to be designed (see figure 1 , figure 2 , image 3 ).

[0048] 2. According to the composition of the target material and the area of ​​the slot, determine the size of the slot length L and width b. The target material composition in this example: gold 10%,...

Embodiment 2

[0052] Example 2: The gold and silver mosaic target material and its preparation method are basically the same as in Example 1, the difference being:

[0053] Target composition: 20% gold, 80% silver; the length L of the gold groove is 50 mm, and the width b is 4 mm.

Embodiment 3

[0054] Example 3: The gold and silver mosaic target material and its preparation method are basically the same as in Example 1, the difference being:

[0055] Target composition: 30% gold, 70% silver; the length L of the gold slot is 60mm, and the width b is 5 mm.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
particle sizeaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to preparation methods of a gold and silver embedded target and a film thereof. The gold and silver embedded target contains 10-30 percent of gold and 70-90 percent of silver. When the target is prepared, a pure silver target is used for carrying out magnetron sputtering to obtain a sputtering runway, a gold slot is opened, and then gold is embedded into the gold slot by adopting a press method; and when an alloy film is prepared, gold and silver on the runway of the gold and silver embedded target are sputtered under the condition of magnetron sputtering to be mixed anddeposited onto a substrate to form a gold and silver alloy film, wherein the magnetron sputtering is carried out under the conditions that the vacuum degree is 1*10<-3> to 5*10<-3>, the sputtering temperature is 20-40 DEG C, the sputtering rate is 20-200nm / minute, and the air pressure is 0.5-1Pa. In the gold and silver embedded target, gold is used for replacing partial silver on a silver target,and the gold and the silver are combined in an embedding mode, so that the utilization ratio of noble metals is high, the target cost is reduced; and the obtained target has the advantages of tight combination, high sputtering efficiency, stable property and good quality; and a prepared gold and silver alloy film has the advantages of stable property and components, higher visible light transmissivity and far infrared reflectivity than those of pure silver films, and better timeliness.

Description

technical field [0001] The invention relates to a magnetron sputtering coating target material and a film thereof, in particular to a preparation method of a gold-silver mosaic target material and a film thereof. Background technique [0002] Magnetron sputtering coating is a new type of physical vapor coating method. Compared with the earlier evaporation coating method, it has obvious advantages in many aspects. As a relatively mature technology, magnetron sputtering has been applied in many fields. [0003] The principle of magnetron sputtering: add an orthogonal magnetic field and an electric field between the sputtered target (cathode) and the anode, fill the high vacuum chamber with the required inert gas (usually Ar gas), and the permanent magnet on the target A magnetic field of 250-350 Gauss is formed on the surface of the material, which forms an orthogonal electromagnetic field with the high-voltage electric field. Under the action of the electric field, the Ar ga...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C22C5/06C23C14/14C23C14/35
Inventor 辛荣生贾晓林蔡彬林钰董林胡斌梅莉莎
Owner ZHENGZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com