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Method and device for realizing far field super-resolution focus

A super-resolution and far-field technology, applied in optical components, optics, instruments, etc., can solve the problems of limited lateral resolution improvement and inability to fully meet the requirements of super-resolution, and achieve the effect of overcoming low energy utilization

Inactive Publication Date: 2010-12-08
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Since the above-mentioned design ideas in the prior art are all aimed at effectively compressing the size of the axial focus spot, in the case of high lateral resolution requirements such as scanning confocal microscopes, the improvement in lateral resolution is limited and cannot be completely improved. Meet the requirements of super-resolution

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  • Method and device for realizing far field super-resolution focus
  • Method and device for realizing far field super-resolution focus
  • Method and device for realizing far field super-resolution focus

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Embodiment Construction

[0041] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments, but the present invention is not limited thereto.

[0042] figure 1 Shown is a schematic structural view of an embodiment of the device for realizing far-field super-resolution focusing of the present invention.

[0043] like figure 1 As shown, a device for realizing far-field super-resolution focusing includes: a laser 1 , a spatial light modulator 2 , a vortex-distributed 0-2π phase plate 3 and an apochromat lens 4 . The laser 1, the spatial light modulator 2, the 0-2π phase plate 3 with vortex distribution and the apochromat lens 4 are located on the coaxial optical path. Among them, the 0-2π phase plate 4 with vortex distribution is a vortex phase plate (Vortex 0-2π Phase Plate) VPP-1A produced by RPC photonics, USA.

[0044] The light beam R emitted by the laser 1 will sequentially pass through the spatial light modulator 2, the 0-2π phase plate...

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Abstract

The invention discloses a method for realizing far field super-resolution focus, which comprises the following steps: modulating an incident light ray emitted by a laser to a tangential polarized light; carrying out 0-2pi vortex phase coding on the tangential polarized light; and carrying out the far field super-resolution focus on the tangential polarized light which is subject to the 0-2pi vortex phase coding, thus realizing far field focus and horizontal super-resolution and meeting demands of visible light super-resolution focus, especially a scanning confocal microscope. The invention also discloses a relevant device which is applied to the method for realizing the far field super-resolution focus. The invention has simple method and wide application; the horizontal focus effect of the invention is superior to that of the prior art; and the device of the invention has simple system structure, low cost and universality, in particular being suitable for being applied in measuring equipment for precise or ultraprecise microcosmic observation, especially the scanning cofocal microscope.

Description

technical field [0001] The invention belongs to the field of microscopic observation and measurement, and in particular relates to a method and a device for realizing far-field super-resolution focusing. Background technique [0002] Due to its good monochromaticity, directivity and high brightness, laser beams are widely used in various precision or ultra-precision microscopic observation and measurement equipment, such as data storage equipment, lithography equipment, high-precision measurement equipment, image Processing equipment and confocal scanning microscopes, etc. In order to achieve high resolution accuracy and stable working status of observation and measurement equipment, it is often required to converge laser beams into as small a focused spot as possible in the far field. [0003] In order to meet the above technical requirements, in the fields of data storage and photolithography, short-wavelength light such as deep ultraviolet light is often used for focusin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/58G02B5/00
Inventor 匡翠方郝翔王婷婷刘旭
Owner ZHEJIANG UNIV
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