Novel semiconductor light-emitting diode
A technology of light-emitting diodes and semiconductors, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of reduced electrode reliability, current congestion of LED devices, and reduced light output, so as to enhance lateral current diffusion, eradicate shading effects, and avoid The effect of heat concentration
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[0018] Such as figure 2 Shown: the present invention relates to a novel semiconductor light-emitting diode, comprising sequentially compounded phosphor layer 17, substrate 11, buffer layer 12, N-type layer 12, active layer 14, with a selected thickness of 10 nanometers, 100 nanometers or 200 nanometers Nanometer electron blocking layer 15, P-type layer 16 with a thickness of 10 nanometers, 1 micron or 8 microns, P-type contact metal layer 203, P-type contact metal layer 203 and N-type contact metal layer 201 separated by insulating layer 205 Etching is performed locally on the surface of the P-type layer 16 of the LED device to form three grooves, which respectively penetrate the P-type layer 16, the active layer 14 and part of the N-type layer 13, thereby exposing the surface of the N-type layer 13 material On the side of the P-type material, the gallium nitride-based material of the N-type layer is In x Al y Ga 1-x-y N(0≤x≤1, 0≤y≤1, 0≤x+y≤1), and the ratio of x and y can...
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