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High power microwave plasma diamond film deposition device

A high-power microwave and diamond film technology, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of hindering microwave input power and limited adjustment of resonant cavity, and achieve easy real-time adjustment, microwave Small energy loss and optimized deposition conditions

Active Publication Date: 2011-10-12
HEBEI PLASMA DIAMOND TECH
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  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

First, the design prevents the concave microwave excitation part from being directly water-cooled, which in turn hinders the improvement of microwave input power
Second, the design can only adjust the height of the deposition table, so the adjustment effect on the resonant cavity is limited

Method used

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  • High power microwave plasma diamond film deposition device
  • High power microwave plasma diamond film deposition device
  • High power microwave plasma diamond film deposition device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1. After the microwave plasma diamond film deposition equipment is evacuated to below 1Pa with a vacuum pump, a mixed gas composed of 98% hydrogen and 2% methane is introduced into the equipment, and the gas pressure is adjusted to 5kPa.

[0030] 2. Pass cooling water to all parts of the equipment that need to be cooled.

[0031] 3. Input 2.45GHz, 1kW microwave power to the equipment to generate plasma in the resonant cavity.

[0032] 4. Adjust the adjustment mechanism of the resonant cavity so that the intensity of the plasma is the strongest, and its position is above the deposition table. At this time, the microwave power reflected back by the resonator also reaches a minimum value.

[0033] 5. Gradually increase the microwave power input to the equipment and the gas pressure to 10kW and 20kPa.

[0034] 6. At the same time, gradually adjust the adjustment mechanism of the resonant cavity, so that the intensity of the plasma is the strongest, and its position is abo...

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Abstract

The invention relates to a high power microwave plasma diamond film deposition device, which belongs to the technical field of chemical gas-phase deposition of the diamond film, and comprises an upper cylindrical body of a microwave cavity, a lower cylindrical body of the microwave cavity, a diamond film deposition platform, a microwave reflection body, a quartz window, a plasma, an adjusting mechanism A and an adjusting mechanism B. The diamond film deposition platform and the microwave reflection body are arranged inside the upper and the lower cylindrical bodies, and the quartz window is arranged below the diamond film deposition platform; and the height of the microwave reflection body is adjusted through the adjusting mechanism A, the height of the upper cylindrical body is adjusted by the adjusting mechanism B, and the microwave reflection body reflects and strengthens the microwave electric field. The upper cylindrical body, the lower cylindrical body, the diamond film deposition platform, the microwave reflection body, the adjusting mechanism A and the adjusting mechanism B can realize the direct water cooling. Under the high power, the diamond film of high quality is deposited at a high speed, and the device has the advantages of reliability, convenient adjustment and the like.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition of diamond films, and provides a device for using microwave energy to excite plasma to deposit diamond films. Background technique [0002] Diamond film materials have many excellent properties, including extremely high hardness and elastic modulus, high room temperature thermal conductivity, wide spectral transmission range, high breakdown electric field strength, and high carrier mobility. etc. Therefore, diamond films have broad application prospects in various fields of modern technology, and depositing high-quality diamond film materials at a relatively high rate is a long-term goal pursued by the industry. [0003] The method of using microwaves to generate plasma to deposit diamond films is currently the main method used to deposit high-quality diamond films. In order to be able to deposit high-quality diamond film materials at a higher rate, firstly, it is necessary to ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27C23C16/513
Inventor 唐伟忠李晓静于盛旺王凤英
Owner HEBEI PLASMA DIAMOND TECH
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