Microwave plasma generating devices and plasma torches
A technology of plasma and equipment, which is applied in the field of plasma equipment, can solve problems such as difficult to achieve impedance matching, and achieve the effects of optimizing VHF power transfer, easy impedance matching, and easy realization
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0086] Figure 1a with 1b A device 1 according to the invention is schematically illustrated in which a microstrip 2 with a curved shaped face is connected to a very high frequency generator. The microstrip 2 is fixed to the surface of a dielectric support 3, one edge of which supports 3 coincides with a curved edge of the microstrip. A slot 4 is provided in the dielectric, gas is injected into the slot 4 , and a plasma 5 is generated in the slot 4 . The substrate 6 to be processed is averagely perpendicular to the face of the microstrip and has a warped shape matching the curvature of the dielectric and the microstrip, and the substrate 6 is driven under the device in the direction indicated by the arrow. According to this embodiment, the substrate is perpendicular to the microstrips and the treatment is a post-discharge plasma treatment.
[0087] Figure 2a with 2b A device 7 according to the invention is schematically illustrated in which a warp-shaped microstrip 8 is ...
PUM
Property | Measurement | Unit |
---|---|---|
dielectric loss | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com