High-growth-rate Dunaliella tertiolecta obtained through ethylmethane sulfonate mutation breeding
A technology of Dunaliella and algae strains, applied in the field of microbial engineering, can solve the problems of less breeding research, low probability of mutant strains, time-consuming and labor-intensive problems
Active Publication Date: 2011-01-05
ENN SCI & TECH DEV
View PDF0 Cites 2 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, there are few breeding studies on its growth rate.
At present, the mutation breeding of Dunaliella mainly uses ultraviolet mutagenesis, but ultraviolet mutagenesis has the disadvantages of time-consuming and labor-intensive, and the probability of obtaining mutant strains is small.
Ethyl methanesulfonate (EMS), as a strong chemical mutagen, is mainly used in the mutagenesis breeding of Spirulina in algae breeding, but it has not been reported for the growth rate screening of fast-growing algal strains
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
Embodiment 2
Embodiment 3
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Property | Measurement | Unit |
---|---|---|
length | aaaaa | aaaaa |
Login to View More
Abstract
The invention relates to a method adopting ethylmethane sulfonate (EMS) to perform chemomorphosis on Dunaliella tertiolecta, which performs screening by using the growth rate of microalgae as an index under a normal culture condition to finally obtain a mutagenic strain ENN0001-7 with higher growth rate compared with a wild strain. Compared with the wild strain, the chlorophyll content (OD680) ofthe mutagenic strain obtained by the method is increased by 8.9 percent, and the biomass (OD750) is increased by 5.9 percent. The strain with stable and high growth rate obtained by the method provides a valuable germ plasm resource for mass production.
Description
Dunaliella with high growth rate obtained by mutagenesis with ethyl methanesulfonate technical field The present invention relates to the field of microbial engineering, in particular, the present invention relates to a method for using ethyl methanesulfonate to induce and breed Dunaliella, and a Dunaliella mutagenic strain ENN0001 with a high growth rate obtained by said method -7. Background technique Dunaliella is a kind of unicellular eukaryotic green algae without cellulose outer wall. They are mostly found in salt lakes and oceans, although they have been reported to have been found in fresh water. Dunaliella resembles Chlamydomonas, and domestic scholars classify them into the genus Euchlorophyceae, Volvox, Salinaceae, and Dunaliella. Dunaliella cells are very tiny. Judging from the dozen species of Dunaliella that have been reported so far. The largest cell is D. salina, with a volume of about 2600 μm3 (24~25×12~16 μm), and the smallest is D. minuta, which is o...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C12N1/12C12N15/01C12P23/00C12P17/04C12P17/06C12P7/22C12P7/64C12R1/89
CPCY02E50/13Y02E50/10
Inventor 吴洪尹顺吉王媛媛邓平蔡忠贞袁普卫
Owner ENN SCI & TECH DEV
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com