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Gas charging equipment and gas inlet port device

A technology of inflatable equipment and gas supply device, which can be used in mechanical equipment, microlithography exposure equipment, packaging through pressurization/gasification, etc., can solve problems such as gas leakage, and achieve cost-saving effects

Inactive Publication Date: 2009-11-18
GUDENG EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The invention provides an inflatable device and an air inlet p

Method used

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  • Gas charging equipment and gas inlet port device
  • Gas charging equipment and gas inlet port device
  • Gas charging equipment and gas inlet port device

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Embodiment Construction

[0075] Since the present invention discloses an inflatable device with an air inlet port device, some of the detailed manufacturing or processing processes related to photomasks, semiconductor components, storage devices or inflatable devices used in it are completed by using existing technologies, so the following In the above description, it is not fully described. Moreover, the drawings in the following texts are not completely drawn according to the actual relevant dimensions, and their function is only to express the schematic diagrams related to the features of the present invention.

[0076] First, please refer to the figure 1 , a schematic diagram of the inflatable device 1 of the present invention. The inflatable device 1 is connected to the gas supply device 3 for introducing gas into at least one storage device 4 for storing semiconductor components or photomasks, and the storage device 4 has at least one gas inlet portion 41 . The inflatable device 1 includes at ...

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Abstract

The invention relates to gas charging equipment and a gas inlet port device thereof. The gas charging equipment is connected with a gas supply device so as to be used for guiding the gas into a semiconductor component or light shield storing device with a gas inlet part. The gas charging equipment comprises a supporting seat and at least one gas inlet port device, wherein the supporting seat is used for supporting the storing device; the gas inlet port device is arranged on the supporting seat and corresponds to the gas inlet part of the storing device; and the gas is filled into the storing device from the gas inlet port device. The gas inlet port device is provided with a first base, a second base, a first elastic element, a fixing element and a switching device, wherein the first base and the second base are respectively provided with a through hole, and the through hole of the first base corresponds to the through hole of the second base; the first elastic element is used for keeping the gas tightness, is arranged on the second base and corresponds to the contact part of the gas inlet part of the storing device; the fixing element is used for fixing the elastic element on the second base; and the switching device is arranged in the through holes of the first base and the second base and is used for controlling the gas which enters or is discharged from the gas inlet port device.

Description

technical field [0001] The present invention relates to an inflatable device and an air inlet port device, and more particularly to an inflatable device for introducing gas into at least one storage device for storing semiconductor components or photomasks. Background technique [0002] The rapid development of modern semiconductor technology, in which optical lithography technology plays an important role, as long as it is about the definition of graphics, it needs to rely on optical lithography technology. In the application of optical lithography technology in semiconductors, the designed circuit is made into a light-transmitting mask with a specific shape. Using the principle of exposure, the light source is projected onto the silicon wafer through the mask to expose and display a specific pattern. Since any dust particles (such as particles, dust or organic matter) attached to the mask will cause the quality of projection imaging to deteriorate, the mask used to genera...

Claims

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Application Information

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IPC IPC(8): H01L21/00H01L21/673H01L21/677G03F1/00G03F7/20B65D81/20B65B31/04F17C6/00G03F1/66
Inventor 潘勇顺陈俞铭
Owner GUDENG EQUIP CO LTD
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