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Mask-plate bearing bed and photo-etching device and double-exposure method thereof

A technology of lithography equipment and mask plate, which is applied in the field of semiconductor manufacturing process and can solve the problems of inaccurate imaging and so on

Active Publication Date: 2009-09-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to solve the problem of inaccurate imaging in the prior art due to the complexity and density of graphics caused by one exposure

Method used

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  • Mask-plate bearing bed and photo-etching device and double-exposure method thereof
  • Mask-plate bearing bed and photo-etching device and double-exposure method thereof
  • Mask-plate bearing bed and photo-etching device and double-exposure method thereof

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Embodiment Construction

[0029] In order to make the purpose and features of the present invention more obvious and understandable, the present invention will be further described by giving preferred embodiments and in conjunction with the accompanying drawings.

[0030] An embodiment of the present invention provides a reticle holder capable of installing two reticles at the same time, please refer to figure 2 , which is a schematic diagram of the structure of the reticle holder. The reticle holder 200 includes:

[0031] The mask holder 210 is an important part, and other parts play an auxiliary role in the installation and positioning of the mask on the basis of the holder.

[0032] The first reticle installation position 211 and the second reticle installation position 212 are arranged on the reticle holder 210, and reticle A (4) and reticle B (5) can be installed at the same time on these reticle installation positions , the size and structure of the two installation positions are exactly the s...

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Abstract

The invention provides a mask-plate bearing bed which comprises a mask-plate holder. The installing position of a first mask plate and the installing position of a second mask plate are arranged on the mask-plate holder, the installing position of a mark plate is arranged on the middle position of the mask-plate holder, a plurality of mask-plate vacuum absorbing slots are respectively arranged in the installing positions of the first mask plate and the second mask plate to be used for absorbing and fixing the mask plates, the installing position of a pyramid lens is arranged on one side of the mask-plate holder to be used for installing a pyramid prism, the installing position of a micromotor is arranged on the mask-plate holder, and the coating surface of a reflector is on one side surface of the mask-plate holder, thus, the invention uses the mask-plate bearing bed for orderly and independently exposing two different mask plates on the same rubberized layer, and the double-exposure technology can decompose a 2D image into two 1D images which can be easily and accurately generated.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing process, in particular to a reticle holder for a double exposure process, photolithography equipment and a double exposure method thereof. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern and under the projection objective, the mask pattern is again exposed on another exposed area of ​​the wafer, and th...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 齐宁宁齐芊枫李志龙
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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