Method for preparing mesoporous silicon adsorption material with high specific surface area
A technology of high specific surface area and adsorption material, applied in the field of adsorption material preparation, can solve the problems of poor adsorption, low stability and high price, and achieve the effects of high stability, simple equipment and low price
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specific Embodiment approach 1
[0008] Specific Embodiment 1: The preparation method of the high specific surface area mesoporous silicon adsorption material in this embodiment is realized according to the following steps: 1. The cetylpyridinium chloride solution with a molar concentration of 50 to 70 mmol / L and a volume of 200 to 300 mL Adjust the pH to 1.0 with hydrochloric acid solution, add the sodium silicate solution with a molar concentration of 2 to 3 mol / L and a volume of 40 to 60 mL dropwise into the cetylpyridinium chloride solution under stirring conditions, and continue to stir for 2.5 to 60 mL. 3.5h, to get a precipitate; 2. Wash the precipitate with deionized water until no foam is generated in the washing liquid, then dry it at a temperature of 50-70°C for 1.5-2.5h, and then dry it at a temperature of 500-700°C Calcination treatment at ℃ for 5-7 hours to obtain a high specific surface area mesoporous silicon adsorption material; wherein the stirring speed in step 1 is 150-200 r / min.
[0009] ...
specific Embodiment approach 2
[0011] Embodiment 2: This embodiment differs from Embodiment 1 in that the molar concentration of the cetylpyridinium chloride solution in step 1 is 55-65 mmol / L and the volume is 220-280 mL. Other steps and parameters are the same as those in Embodiment 1.
specific Embodiment approach 3
[0012] Embodiment 3: This embodiment differs from Embodiment 1 in that the molar concentration of the cetylpyridinium chloride solution in step 1 is 60 mmol / L and the volume is 250 mL. Other steps and parameters are the same as those in Embodiment 1.
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