Preparation of AZO target material for thin-film solar cell
A solar cell, zinc-aluminum oxide technology, applied in metal material coating process, ion implantation plating, coating and other directions, to achieve the effects of good uniformity, easy doping, and cost-effectiveness
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Embodiment 1
[0015] Add zinc acetate with a purity of 99.0% and aluminum nitrate with a purity of 99.1% to a stirred reactor, add water to dissolve it, add NaOH to adjust the pH to 7.0, and perform liquid phase conversion at 140°C for 2 hours to produce zinc oxide The aluminum is precipitated, filtered, dehydrated and dried to form a powder, and sintered at 500°C for 2 hours to obtain a zinc-aluminum oxide powder with an alumina content of 2.5%. The powder was sintered at 1300° C. for 3 hours under a vacuum of 1 Pa and a pressure of 50 MPa to make a ZAO target with a relative density of 98%. The resistivity of the ZAO thin film prepared by magnetron sputtering deposition using this target is 9.7×10 -4 Ω·cm, the visible light transmittance is 85%.
Embodiment 2
[0017] Add zinc nitrate with a purity of 99.1% and aluminum nitrate with a purity of 99.3% into a stirred reactor, then add water to dissolve it, add NaOH to adjust the pH to 8.5, and perform liquid phase conversion at 95°C for 1 hour to produce zinc and aluminum oxide Precipitated, filtered, dehydrated and dried to form a powder, and sintered at 400°C for 2 hours to obtain a zinc-aluminum oxide powder with an alumina content of 3.0%. The powder was sintered at 1200° C. for 5 hours under a vacuum degree of 50 Pa and a pressure of 50 MPa to make a ZAO target material with a relative density of 96%. The resistivity of the ZAO thin film prepared by magnetron sputtering deposition using this target is 5.8×10 -4 Ω·cm, the visible light transmittance is 89%.
Embodiment 3
[0019] Add zinc acetate with a purity of 99.3% and aluminum nitrate with a purity of 99.1% into a stirred reactor, then add water to dissolve it, add NaOH to adjust the pH to 8.0, and perform liquid phase conversion at 120°C for 2 hours to produce zinc oxide The aluminum is precipitated, filtered, dehydrated and dried to make a powder, and sintered at 550°C for an hour to obtain a zinc-aluminum oxide powder with an alumina content of 3.5%. The powder was sintered at 1350° C. for 2.5 hours in a vacuum of 30 Pa and a pressure of 100 MPa to make a ZAO target with a relative density of 99%. The resistivity of the ZAO thin film prepared by magnetron sputtering deposition using this target is 1.2×10 -4 Ω·cm, the visible light transmittance is 94%.
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