Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Stamping apparatus

A technology of pressure chambers and chambers, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of soft mold deformation or damage, difficult separation, etc., and achieve the effect of reducing size, easy separation, and reducing space

Inactive Publication Date: 2012-04-04
WEIHAI DMS OPTICAL ELECTROMECHANICAL CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] Moreover, when the soft mold is separated from the substrate from the contact state, it is sometimes difficult to separate it because the resin layer on the substrate will stick to the soft mold.
And at this time, since the soft mold is made of soft materials, it is easy to cause deformation or damage of the soft mold

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stamping apparatus
  • Stamping apparatus
  • Stamping apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] Hereinafter, preferred embodiments of the present invention will be described in detail in conjunction with the accompanying drawings.

[0039] The following descriptions are within the scope of implementation by those skilled in the art.

[0040] Therefore, the embodiments of the present invention may have various modifications, and the protection scope thereof is not limited to the following embodiments.

[0041] figure 1 It is a schematic diagram of the overall structure of an embodiment of an imprinting device for forming an etching region on a substrate according to the present invention, wherein reference numeral 2 denotes a frame.

[0042] The frame 2 is a rectangular frame formed by welding or screwing a plurality of metal pipes (or metal strips) by a conventional method, which is preferably supported on the ground by a backing plate K1 such as a rubber plate, so as to absorb the floor shock force.

[0043] Furthermore, a cavity 4 is provided on the inner sid...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention discloses an impression device which can form an etching area and a non-etching area on a substrate used by flat panel display element with a simple mode. The device comprises the following components: a frame; a chamber which is provided with a first chamber casing and a second chamber casing that are set one an upper position and a lower position on the frame and form an openable closing space through combining operation or separation operation; a soft mould which is provided with a pattern surface that is used for differentiating the etching area and non-etching area and is positioned in the closed space of chamber; an objective table which is provided with a loading surface that is used for loading the substrate and moves up-and-down relatively to the soft mould in the closed space of chamber; and a hardening mechanism which moves from one side to the other side of objective table and simultaneously irradiates ultraviolet.

Description

technical field [0001] The present invention relates to an imprinting device that can distinguish and form patterns of etching regions and non-etching regions on a flat panel display substrate in a simple manner, and in particular relates to an imprinting device that can further improve work efficiency when processing large-area substrates, and through uniform pressure to imprint the entire surface of the substrate, thereby providing an imprint device with improved pattern quality. Background technique [0002] In the manufacture of flat panel displays, in order to form etched regions and non-etched regions on the substrate, an exposure method based on a photosensitive liquid or an imprint method based on a soft mold is generally used. [0003] The imprinting device used in the imprinting method includes: a cavity shell with a sealed space, which can be switched between atmospheric pressure and vacuum pressure environment; the stage is arranged inside the cavity shell for A...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00
CPCH01L21/6715H01L21/68778
Inventor 朴春成吴相泽申泰炅李真香郑昌镐李宰一
Owner WEIHAI DMS OPTICAL ELECTROMECHANICAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com