Reflection-permeation array substrate and method for manufacturing same
A manufacturing method and technology for an array substrate, which are applied in the photoengraving process, optics, optomechanical equipment and other directions of the pattern surface, can solve the problems of difficult setting and rising manufacturing costs, and achieve the goal of reducing the problem of rising costs, improving quality, The effect of simplifying manufacturing engineering
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[0034]FIG. 1 is a schematic structural diagram of a first embodiment of a transflective array substrate of the present invention. As shown in Figure 1, the anti-transmissive array substrate includes: a soft substrate 1 and an array body, wherein the soft substrate 1 is provided with a transmissive area and a reflective area, and embossing is formed on the soft substrate 1 corresponding to the reflective area. The flower is composed of pits, and a reflective plate 7 with uniform thickness is arranged on the embossing. The main body of the array is located on the side of the soft substrate 1 provided with the reflective plate 7. The main body of the array includes grid lines (not shown in the figure), grid electrodes 2 , gate insulating layer 3, active layer 4, source and drain electrodes 5, data lines (not shown in the figure), passivation layer 8 and pixel electrode 9; the main structure of the array is specifically: a soft substrate provided with a reflector 7 1 is provided w...
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