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Photomask manufacturing method, pattern copy method, photomask and data base

A manufacturing method and photomask technology are applied in the fields of photomask and database, photomask manufacture, and liquid crystal display device manufacture.

Active Publication Date: 2011-12-07
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when the area of ​​the grayscale part becomes small, due to the influence of the light-shielding part or the light-transmitting part adjacent to the grayscale part, the above-mentioned transmittance will become the transmittance inherent in the semi-transparent film during actual exposure. When the transmittance is different, the transmittance inherent to the semi-transparent film cannot be treated as an effective value

Method used

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  • Photomask manufacturing method, pattern copy method, photomask and data base
  • Photomask manufacturing method, pattern copy method, photomask and data base
  • Photomask manufacturing method, pattern copy method, photomask and data base

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Embodiment Construction

[0084] Hereinafter, the best mode for carrying out the present invention will be described.

[0085] [Summary of Manufacturing Method of Photomask Related to the Present Invention]

[0086] According to the method for producing a photomask of the present invention, whenever a photomask having a predetermined pattern is used on a transparent substrate to be copied (a desired film is formed on a glass substrate or the like and covered with a resist film) ) When using an exposure device for exposure, the pattern copied on the object to be copied is predicted based on the light intensity distribution captured by the imaging unit through the exposure in the exposure device, and the photomask is manufactured based on this prediction method.

[0087] More specifically, it includes a method of making exposure conditions simulating the exposure conditions in the exposure device, and making a pattern similar to a pattern reproduced on the object to be reproduced by exposure performed o...

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Abstract

A method for manufacturing photo-mask, method for transferring pattern, photo-mask, and database is provided to obtain gray mask efficiently as desired by using exposure unit reproduce an exposure condition in the database. In a method for manufacturing photo-mask, a test exposure to the test mask in which the predetermined test pattern is molded is performed by using excellent exposure condition, and transmission light pattern of this test pattern with the imaging device is obtained. A transmission light pattern data is obtained based on the obtained transmission light pattern. Effectiveness transmittance of the test pattern under the exposure condition is obtained based on transmission light pattern data. The manufacturing method of photo-mask wherein the film thickness of the material is formed under the predetermined exposure condition on the pattern layout including the half light-transmitting part, and the domain including the half light-transmitting part or the domain is determined based on the effectiveness transmittance.

Description

technical field [0001] The present invention relates to a photomask manufacturing method, a pattern replication method, a photomask, and a database for manufacturing photomasks used in the manufacture of electronic components, and more particularly, to designing light by simulating effective transmittance A photomask manufacturing method for a mask, a pattern replication method, a photomask, and a database. The present invention also particularly relates to a multi-grayscale photomask (hereinafter, also referred to as a gray-tone (gray-tone) mask) having a light-shielding portion, a light-transmitting portion, and a translucent portion through which a part of the exposure light passes. A photomask manufacturing method, a photomask, a pattern replication method, and a database for designing a pattern shape of a semi-transparent portion, and designing a film thickness and a film material of a semi-transparent film. [0002] Also, as an electronic component is a display device r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/336G01N21/59G03F1/84G03F1/68H01L29/786G03F1/54
CPCG03F1/32G03F1/84G03F7/70666
Inventor 吉田光一郎井村和久
Owner HOYA CORP
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