Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Funeral monument image and manufacture method thereof

A production method and technology for tombstones, applied in tombs, monuments, mirrors, etc., can solve problems such as easy breakage, loss of shadow, and lack of good protection, and achieve the effect of not being afraid of rain and sand erosion.

Inactive Publication Date: 2008-11-12
王文章
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, most of the tombstones in my country's funeral market are made of ceramics, metals, organic boards, crystals, plastics, cloth, paper, etc. The images are directly imaged on these materials and exposed to the air, so they cannot be well captured. Protection, this method can not solve the problem of not losing the image for a long time outdoors, not afraid of the sun, not afraid of humidity, not afraid of rain and sand erosion, anti-oxidation, etc. Due to the above reasons, there are disadvantages such as easy damage, fragmentation, and loss of image , but cannot make the tombstone look like a long-term well-preserved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Funeral monument image and manufacture method thereof
  • Funeral monument image and manufacture method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0009] Such as figure 1 As shown, the tombstone image of this embodiment includes an imaging plate 1, a bottom plate 2, and a transparent top plate 3. The bottom plate 2 and the transparent top plate 3 are both made of acrylic plates, and the top surface of the bottom plate 2 is engraved with a groove 5 corresponding to the shape of the imaging plate. The imaging plate 1 is embedded in the groove 5, and the transparent top plate 3 is glued on the upper surface of the bottom plate 2 and the imaging plate 1.

[0010] How to make the tombstone statue:

[0011] a. First, image the processed portrait on the imaging plate 1;

[0012] b. Inlay the processed imaging plate 1 in the groove 5 of the bottom plate 2;

[0013] c. Carry out a fully enclosed treatment, apply shadowless glue on the surface around the groove 5 of the bottom plate, then cover the transparent top plate 3, and cure it with ultraviolet rays;

[0014] d. Polish the four sides of the molded product.

Embodiment approach 2

[0016] The difference from the first embodiment is that an anti-ultraviolet film 4 is pasted between the imaging plate 1 and the transparent top plate 3.

[0017] Production Method:

[0018] The anti-ultraviolet film 4 is directly attached to the upper surface of the imaging plate 1 after the step a of the manufacturing method of the embodiment 1, and the film and the imaging plate 1 are closely and seamlessly combined to achieve the purpose of vacuum. The rest of the steps are the same as in the first embodiment.

Embodiment approach 3

[0020] Such as figure 2 As shown, the difference from Embodiments 1 and 2 is that an anti-ultraviolet film 4 is pasted on the upper surface of the transparent top plate 3.

[0021] Production Method:

[0022] On the basis of the manufacturing method of Embodiment 1 or 2, after the tombstone image is fully enclosed, the UV-proof film 4 is directly pasted on the upper surface of the transparent top plate 3 to make it closely and seamlessly combined, and then polished.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to tombstone image belonging to funeral and interment product, and its manufacture method. The tombstone image comprises an image-forming plate, a bottom plate and a transparent top plate which are both manufactured by accrylic board. The bottom plate upper surface is engraved with groove whose shape is relevant to image-forming plate which is inlaid in groove; transparent top plate agglutinates on the upper surface of bottom plate and image-forming plate. The manufacture method of tombstone image is: the processed human portrait is imaged on image-forming plate first; the processed image-forming plate is inlaid in bottom plate groove; then groove is totally enclosed by coating shadow-free glue on the bottom plate groove peripheral surface and covering transparent top plate and curing with ultraviolet ray; four sides of moulding tombstone image are polished. The present invention has advantages of image durability, which means it can endure solarization, dampness, rain drenching,wind and sand erosion and oxidation or the like and can be long-termly preserved intactly outdoors.

Description

Technical field [0001] The invention relates to funeral and interment supplies, in particular to a tombstone image and a manufacturing method thereof. Background technique [0002] At present, most of the tombstone images in my country’s funeral and interment market are made of ceramics, metals, organic plates, crystals, plastics, cloth, paper, etc. The images are directly imaged on these materials and exposed to the air, and they are not very good. Protection, this method can not solve the problems of long-term outdoor loss, not afraid of sun, not afraid of damp, not afraid of rain and sand erosion, anti-oxidation, etc. Due to the above reasons, there are shortcomings such as easy breakage, chipping, and loss of shadow. , And can't make the tombstone image well preserved for a long time. Summary of the invention [0003] The purpose of the present invention is to provide a tombstone image that can be preserved for a long time outdoors and a manufacturing method thereof. [0004...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A47G1/00A47G1/14E04H13/00
Inventor 王文章
Owner 王文章
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com