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Reciprocating straight-line and rotating motion grinding polishing device

A rotary motion, reciprocating straight line technology, used in grinding/polishing equipment, surface-polished machine tools, metal processing equipment, etc. The effect of flatness and finish as well as parallelism, uniform distribution of abrasive particles

Inactive Publication Date: 2008-08-27
SHENYANG CAIJIA MECHANICAL EQUIP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It solves the problem that the "heart height" of the material to be ground and polished has large unevenness, the flatness of the sheet is not high, and the parallelism is not good.

Method used

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  • Reciprocating straight-line and rotating motion grinding polishing device
  • Reciprocating straight-line and rotating motion grinding polishing device
  • Reciprocating straight-line and rotating motion grinding polishing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The present invention will be described in detail below with reference to the accompanying drawings.

[0020] Such as image 3 , 4 As shown, the grinding and polishing device includes a grinding and polishing disc 3, a rotating body 2, a grinding and polishing disc driving motor 1, a loading tray 5, a loading tray bracket 7, an active bracket guide wheel 8, a passive bracket guide wheel 9, and a guide wheel drive Motor 6, linear guide rail seat 10, guide rail driving motor 11, eccentric driving lever 12 and trimming ring 4. Wherein, the surface of the loading disc 5 is glued with the material to be ground and polished, and it faces to be placed on the disc surface of the grinding and polishing disc 3; . The trimming ring 4 is placed among the active support guide wheel 8 and the passive support guide wheel 9, and the active support guide wheel 8 is driven by the motor on the loading tray support 7, and the passive support guide wheel 9 is a passive wheel, which can m...

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PUM

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Abstract

The invention relates to a grinding polishing device for reciprocating linear and rotary motion, in particular to a material processing device. The device comprises a grinding polishing pad, a rotary body, a driving motor of grinding polishing pad, a material loading tray, a support of the material loading tray, a driving support guide wheel, a driven support guide wheel, a guide wheel driving motor, a linear guide rail seat, a guide rail driving motor, an eccentric dial pole and a trimming ring, wherein, the material loading tray bonded to grinded material is arranged face to face on the plane of the grinding polishing pad; the grinding polishing pad is connected with the driving motor of grinding polishing pad; the rotary body is connected with the grinding polishing pad; the external diameter of the material loading tray is sleeved with the trimming ring, which is placed between the driving support guide wheel and the driven support guide wheel; the support of the material loading tray is connected in parallel with the linear guide rail seat, which is connected with the guide rail driving motor through the disc eccentric dial pole on the main shaft of the driving motor. The device solves the problems of large concave and convex 'heart-height' sheet of the grinded materials, low flatness of the sheet, and poor parallelism.

Description

technical field [0001] The invention relates to a material processing equipment, in particular to a device for grinding and polishing two surfaces of non-metallic materials. Background technique [0002] Non-metallic materials (artificial crystals, special ceramics, semiconductors, etc.) can also be called new materials, which are widely used in modern production and life. It changes people's thinking and makes the impossible possible. It represents the trend of technological development and is related to the country's economic lifeline and security. All equipment and daily necessities controlled by integrated circuits, lasers, remote sensing devices, spectral separation components, etc. are inseparable from these new materials. New materials are high-tech basic materials, so the processing requirements are very precise. It is also quite important. For example, the second-generation semiconductor material (the first-generation semiconductor material is single crystal silic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/00H01L21/304
Inventor 张莹
Owner SHENYANG CAIJIA MECHANICAL EQUIP
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