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Method for measuring nano-scale multilayer film structure

A measurement method and multi-layer film technology, which is applied in the field of optical measurement, can solve problems such as the difficulty in solving the diffusion film structure, and achieve the effect of avoiding easy to fall into local minimum

Inactive Publication Date: 2008-06-25
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0015] In order to solve the problem of difficulty in solving the diffusion-type film structure in practice, the present invention proposes a diffusion layer structure model between film layers and a method for measuring film structure parameters, with the purpose of providing a method for measuring nanoscale multilayer film structures. Enabling X-ray Grazing Incidence Reflectance Measurements to Accurately Characterize Nanoscale Multilayer Film Structures

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  • Method for measuring nano-scale multilayer film structure
  • Method for measuring nano-scale multilayer film structure
  • Method for measuring nano-scale multilayer film structure

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Embodiment Construction

[0027] 1. A 40-period Mo / Si multilayer film was prepared on an ion beam sputtering coater, wherein the thickness of the Mo layer was 2.64nm, and the thickness of the Si layer was 3.96nm.

[0028] 2. Utilize the X-ray diffractometer to measure the grazing incidence reflectance R'=R'(θ) of the multilayer film, and the optical path is as shown in Figure 2. The X-ray wavelength is 0.154nm, the working mode is θ-2θ mode, the measurement angle range is θ: 0~5degree, and the scanning step is θ step =0.001degree, detector angular resolution: Δθ=0.016degree.

[0029] 3. Establish the four-layer structure model of the Mo / Si double-layer structure multilayer film [Mo / MoSi 2 / Si / MoSi 2 ], get the X-ray grazing incidence reflectance expression R=R(d1, d2, d3, d4, ρ1, ρ2, ρ3, ρ4, σ, θ) according to formula (1), establish as shown in formula (2) evaluation function. The evaluation function is fitted by a genetic algorithm, and the specific fitting process is shown in Figure 3. The first...

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Abstract

The invention discloses a measurement method for a nanometer multi-layer membrane structure and belongs to the optical measurement technical field. The invention establishes a four-layer structural model in the period at first, then measures the X ray grazing incidence reflection rate R' of the multi-layer membrane, calculates the X ray grazing incidence reflection rate R according to the detailed structural model of the multi-layer membrane, and hereby establishes an evaluation function FOM(d1, d2, d3, d4, rho1, rho2, rho3, rho4, sigma)=1 / Msigma [lg(R'(theta))-lg(R(theta))] 2. The detailed structure of the multi-layer membrane can simply be obtained by adopting the Genetic Algorithm to evaluate the maximum value of the evaluation function about each structural parameter. The invention solves the problem that the routine minimization algorithm is easy to be get into a local minimum value when the routine minimization algorithm fits the detailed structural model of the multi-layer membrane, provides a method which can be used for the detailed structure of the representative multi-layer membrane, and is applicable to representative issues of structural parameters of multi-layer membranes with complex structures.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and relates to the measurement of film complex structure parameters by using X-ray grazing incidence reflectivity, in particular to a method for measuring nanoscale multilayer film structure. technical background [0002] Currently, in the method of using X-ray grazing incidence reflectance to characterize the multilayer film structure, the structural parameters that can be characterized include: layer thickness and density, and interface roughness σ. Japanese Journal of Science discloses a measurement method (I.Kojima and B.Li, The Rigaku Journal, Vol.16, No.2, 31-41 (1999)), the principle of which is as follows: multilayer film X-ray grazing incidence reflection The relationship between the ratio and the multilayer film structure is shown in formula (1): [0003] R=|r 12 | 2 *Gauss(θ) [0004] Among them, r 12 Calculated by the following recursive formula [0005] ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B15/02G01B15/08G01N9/24G01N23/00
Inventor 金春水朱洪力张立超
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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