Method for forming semiconductor device and semiconductor device
A technology for semiconductors and devices, which is applied to the formation method of semiconductor devices and the field of semiconductor devices, can solve the problems of overall performance decline of the device, unfavorable device performance, and cannot be used to make up for sags, etc., and achieves the effects of improving sags and improving performance.
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[0029] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0030] The processing method of the present invention can be widely applied in many applications, and can utilize many suitable materials to make, and below is to illustrate by preferred embodiment, certainly the present invention is not limited to this specific embodiment, this field Common replacements known to those skilled in the art undoubtedly fall within the protection scope of the present invention.
[0031] Secondly, the present invention is described in detail using schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of explanation, the cross-sectional view showing the device structure will not be partially enlarged according to the general scale, which should not be used...
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