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Tectorial membrane dicolpate catchment growth method

A planting method, topling film-covering technology, applied in topling film-covered double ditch water collection planting, dry farming agricultural cultivation, can solve the problems of soil moisture reduction, increase of coverage area, loss, etc.

Inactive Publication Date: 2008-06-11
PINGLIANG AGRI SCI RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The traditional mulching technology is that the surface of the film is higher than the ground level after the film is covered. After the rainfall, the rainwater on the film will generate runoff and cannot directly reach the roots of the crops. The ineffective rainfall of less than 5mm will make it difficult for the crops to use due to the evaporation of the film surface. Mulching film makes the soil moisture stored below the frozen layer lose rapidly with the evaporation of the atmosphere, and the daily average water surface evaporation reaches 9.8mm, so that the plow layer soil forms a large amount of dry soil layer, and it is difficult for spring sown crops to emerge after sowing
At the same time, due to the flat ground sowing, the seedlings should be ruptured immediately after emergence, which is easy to suffer from severe weather such as late frost and late spring cold.
The shortcomings of the full-film double-furrows used in recent years are that the coverage area increases, the runoff of rainfall on the plastic film increases, the amount of water accumulated in the seeding ditch decreases, and the soil moisture in the soil layer within 1 meter decreases by 1.7%-5.4%; If 2kg of plastic film is used per mu, the cost will increase by 30 yuan / mu

Method used

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  • Tectorial membrane dicolpate catchment growth method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] It is planted in Zhuanglang, Gansu.

[0026] 1. For autumn sowing, select a plot with a length of 100m and a width of 30m, apply base fertilizer, and deeply plow and harrow to level it.

[0027] 2. When the surface begins to thaw during the peaking period in mid-February of the following year, water-collecting planting ditches 4 are opened along the length of the plot, with a distance of 40 cm and a depth of 8 cm.

[0028] 3. Two rows of water-collecting planting ditch 4 are used as one ridge 3 to cover the plastic film 2 with a width of 70 cm and a thickness of 0.005 mm, and the edge of the plastic film is compacted with fine soil.

[0029] 4. In mid-to-late April, uncover along the side of the plastic film 2, plant corn in the ditch, the distance between the plants is about 37cm, plant 2 grains in each hole, and the density per mu is about 3600 plants, plant a total of 20 rows, and plant oil sunflowers in the other 20 rows , the plant spacing is the same as that of c...

Embodiment 2

[0032] It is planted in Zhuanglang, Gansu.

[0033] 1. For autumn sowing, select a plot with a length of 100m and a width of 30m, apply base fertilizer, and deeply plow and harrow to level it.

[0034] 2. When the ground begins to thaw during the peak period in mid-February of the following year, water-collecting planting ditches 4 are opened along the length of the plot, with a distance of 50 cm and a depth of 10 cm.

[0035] 3. Two rows of water-collecting planting ditch 4 are used as one ridge 3 to cover the plastic film 2 with a width of 70 cm and a thickness of 0.008 mm, and the edge of the plastic film is compacted with fine soil.

[0036] 4. In mid-to-late April, uncover along one side of the plastic film 2, plant corn in the ditch with a plant spacing of about 37cm, plant 3 grains in each hole, and plant a density of about 3,600 plants per mu. Plant 20 rows in total, and plant oil sunflowers in the other 20 rows , the plant spacing is the same as that of corn, and 20 ...

Embodiment 3

[0039] Take growing potatoes as an example:

[0040] 1. For autumn sowing, select a plot with a length of 100m and a width of 30m, apply base fertilizer, and deeply plow and harrow to level it.

[0041] 2. When the ground begins to thaw during the peak period in mid-February of the following year, water-collecting planting ditches 4 are opened along the length of the plot, with a distance of 50 cm and a depth of 10 cm.

[0042] 3. Before covering the plastic film 2 in the topling period, select 20 rows of potatoes for planting, the distance between plants is 37cm, and plant 3 potato blocks in each hole, and finally cover the plastic film 2, and compact the edge of the film with fine soil.

[0043] 4. Make the water-collecting planting ditch 4 every two rows 3 and cover the plastic film 2 with a width of 70 cm and a thickness of 0.008 mm, and compact the edges of the plastic film with fine soil.

[0044] 5. In the first ten days of May, when the seedlings 1 of the spring sowin...

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Abstract

The invention relates to a tectorial dual-channel water-collecting planting method in ice crust, which is proceeded according to the following methods and procedures that firstly, enough ground fertilizer is fertilized in spring seeding crop land blocks which are preserved in late autumn, the land blocks are deeply ploughed and flatly harrowed, secondly, water-collecting sowing ditches are opened along the length of land blocks in the land blocks which are prepared in the ice crust time after the beginning of spring, thirdly, super-thin films are immediately covered on two ditches, edges are tightly pressed by fine soil, fourthly, one side of mulch film is uncovered when sowing, and sowing is proceeded as mulch film is uncovered, seeds are dibbed in the water-collecting sowing ditches, mulch film is tightly pressed immediately, fifthly, when seedlings which grow under mulch films press mulch film, the positions where seedlings press mulch film are broken and seedlings are released in a sunny morning, and broken mouths are sealed with fine soil quickly. The invention can accumulate rain fall in autumn, and uses rain in the autumn when in spring, and can collect ineffective rain fall smaller than 5mm in spring, and collects, superposes, and utilizes the moisture of the soil on site, and satisfies moisture requirements when in spring seeding periods of crops which are sowed in spring, and the invention adopts the ditch-sowing technique, which can avoid damage to crop seedlings due to late frost and reversal spring coldness.

Description

technical field [0001] The invention relates to the technical field of planting, in particular to a dry-farming agricultural cultivation technique integrating film covering, furrow planting and water collection on the film, and specifically a method for planting with film covering and double furrow water collection. Background technique [0002] The traditional mulching technology is that the surface of the film is higher than the ground level after the film is covered. After the rainfall, the rainwater on the film will generate runoff and cannot directly reach the roots of the crops. The ineffective rainfall of less than 5mm will make it difficult for the crops to use due to the evaporation of the film surface. Covering with film makes the soil moisture stored below the frozen layer lose rapidly with the evaporation of the atmosphere, and the daily average water surface evaporation reaches 9.8mm, so that the plow layer soil forms a large amount of dry soil layer, and it is d...

Claims

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Application Information

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IPC IPC(8): A01G1/00A01G13/02A01B79/00
Inventor 周广业丁宁平孙志强李森杨学贞柴福喜吴永斌
Owner PINGLIANG AGRI SCI RES INST
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