Etching device of organic EL display panel and its method

Abstract

The invention discloses organic electroluminescent display panel etching equipment and a method thereof and relates to display panel etching equipment technical field. The problem to be solved is structure simplification and cost reduction of the panel etching equipment. The display panel etching equipment includes a tape-out opening, a transition unit with an air knife arranged therein, a etching unit used to etch the base plate, a liquid cutting unit arranged on the air knife and used to blow down etching liquid, a rinse unit used to rinse the base plate and an air knife drying unit for cleaning the base plate from an input end to an output end of a base plate in turn. All units are connected by a roller delivery unit used to deliver the base plate. The invention is characterized in that: the etching unit is a cycle etching slot and the rinse unit is a cycle rinse slot. The invention has the advantages of simple structure, easy repair, low manufacture cost, reduced etching time and improved etching effect.

Description

technical field [0001] The invention relates to the technical field of manufacturing electronic semiconductor components, in particular to a technology suitable for etching equipment and related methods of organic electroluminescent panels. Background technique [0002] Organic electroluminescent display device (OLED), as a major branch of flat panel display, has the characteristics of thin panel thickness (less than 2mm), self-illumination, low operating voltage (3-10V), high brightness, high contrast, wide viewing angle and other characteristics. A flat display technology with great potential. Organic electroluminescent display devices have been commercially mass-produced in some manufacturers, but since organic electroluminescent display devices (OLED) are a relatively new display field after all, there are still many difficulties to be overcome. The experimental line equipment for research and development of organic electroluminescent devices is still a necessary equipm...

AI Technical Summary

Problems solved by technology

A simple method of etching the ITO layer or the surface metal layer using different etching tanks and water washing tanks, during which the substrate must be taken out or transported manually and dried, which greatly prolongs the etching process and cannot accurately control the etching time. In addition, due to human The factors cannot be strictly controlled, and it is easy to be damaged and stained during the transmission process, and the quality of the etched substrate cannot be guaranteed

Another situation is to reduce the size of the mass-produced photolithography line and use it as an experimental line (the substrate of the mass-production line is generally very large). In order to improve the efficiency, the mass-produced etching equipment must continuously transmit the substrate, and because the transmission Due to the limitation of speed and etching time, there must be 2-3 etching chambers (or even more) under certain circumstances. In this case, the capital investment will be very large. Simple and efficient lines, less investment, easy repairs, and the shortest possible process

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