Film forming device and method

Abstract

The film forming device of the present invention is a film forming device which vaporizes the liquid charging stock and accumulates it to the substrate to form the film, it is characterized in that it includes the following components: a film forming chamber (2) which holds the substrate (W) interiorly and a plurality of injection valves (3) which are arranged at different positions of the film forming chamber (2) and directly directs the same liquid charging stock into the film forming chamber (2) and vaporize and supply the liquid charging stock by decompressing and boiling it. The adopting of the invention can realize the miniaturization of the film forming chamber further realizes the miniaturization of the film forming device and cause the distribution of depth of the formed film good and the vaporization amount large to increase the production efficiency of film forming.

Description

Technical field [0001] The present invention relates to a film forming device and a film forming method, and more particularly to a film forming device and a film forming method using a chemical vapor growth method. Background technique [0002] In this type of film forming apparatus, for example, there is such an apparatus. As shown in Patent Document 1 (Japanese Patent Laid-Open No. 2004-197135), an injection valve (injector) for ejecting a liquid raw material is provided in the upper part of the film forming chamber. , Spray the liquid raw material directly into the film forming chamber to form a film on the substrate. At this time, the liquid raw material injected from the injection valve boils under reduced pressure and vaporizes. [0003] However, in order to spray the liquid material over the entire substrate using one injection valve, it is necessary to sufficiently leave the distance between the injection valve and the substrate. In this case, the distance between the in...

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Problems solved by technology

[0005] However, there is also a problem that stable supply of raw material gas with a uniform concentration to the substrate and film formation on the substrate are hindered due to clogging of the shower orifice or film formation on the partition plate, etc.

[0006] Further, there is a problem that when the liquid raw material is supplied intermittently, the amount of vaporization per unit time decreases, and the production efficiency of film formation deteriorates.

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