Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries

A wafer manufacturing, blade technology, applied in the fields of ophthalmology, micro-surgery and non-surgical blades and mechanical devices, can solve the problems of poor cutting tools, low efficiency and low efficiency of ophthalmic blades, and achieve the effect of cheap methods

Active Publication Date: 2010-02-03
BEAVER VISITEC INT US
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is both inefficient and ineffective for mass production of high-quality, defect-free ophthalmic blades
Inefficient because steps are added to the manufacturing process
[0010] This approach also inherently has significant cutting edge geometry limitations
The bevels produced by this method are limited to an inefficient 45° for single bevel inserts and an impractical 90° for double bevel inserts
Furthermore, the method severely limits the width of the bevels to a maximum of twice the thickness of the wafer for single bevel inserts and half the thickness of the wafer for dual bevel inserts
These geometries result in poor cutting tools as evidenced by little adoption in the ophthalmic community

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries
  • Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries
  • Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0069] Various features of the preferred embodiment will now be described with reference to the drawings, wherein like parts are designated by like reference numerals. The following description of what is presently believed to be the best mode of practicing the invention is not presented in a limiting sense, but merely to illustrate the general principles of the invention.

[0070] The systems and methods of the present invention provide a method of manufacturing a surgical blade for cutting soft tissue. Although the preferred embodiment is illustrated in terms of a surgical blade, a large number of cutting devices can also be fabricated according to the methods of the present invention discussed in detail below. Thus, it will be clear to those skilled in the art that although reference is made to "surgical blades" throughout these discussions, numerous other types of cutting devices can be manufactured including, for example, razors, lancets, hypodermic needles, sampling cann...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Ophthalmic surgical blades are manufactured from either a single crystal or poly-crystalline material, preferably in the form of a wafer. The method comprises preparing the single crystal or poly-crystalline wafers by mounting them and etching trenches into the wafers using one of several processes. Methods for machining the trenches, which form the bevel blade surfaces, include a diamond blade saw, laser system, ultrasonic machine, a hot forge press and a router. Other processes include wet etching (isotropic and anisotropic) and dry etching (isotropic and anisotropic, including reactive ionetching), and combinations of these etching steps. The wafers are then placed in an etchant solution which isotropically etches the wafers in a uniform manner, such that layers of crystalline or poly-crystalline material are removed uniformly, producing single, double or multiple bevel blades. Nearly any angle can be machined into the wafer, and the machined angle remains after etching. The resulting radii of the blade edges is 5-500 nm, which is the same caliber as a diamond edged blade, but manufactured at a fraction of the cost. A range of radii may be 30 to 60 nm, with a specific implementation being about 40 nm. The blade profile may have an angle of, for example, about 60 DEG. The ophthalmic surgical blades can be used for cataract and refractive surgical procedures, as well as microsurgical, biological and non-medical, non-biological purposes. Surgical and non-surgical blades and mechanical devices manufactured as described herein can also exhibit substantially smoother surfacesthan metal blades.

Description

[0001] Documents included by reference [0002] This application contains subject matter related to five U.S. Provisional Patent Applications: Serial No. 60 / 362,999, filed March 11, 2002, entitled "System and Method for the Manufacture of Surgical Blades," 60 / 430,322, entitled "System and Method for the Manufacture of Surgical Blades", and 60 / 503,458, filed September 17, 2003, entitled "System and Method for Creating Linear and Non-Linear Trenches in Silicon and Other Crystalline Materials with a Router", Serial No. 60 / 503,459, filed September 17, 2003, entitled "Silicon Blades for Surgical and Non-Surgical Use", Serial No. 60 / 566,397, filed April 30, 2004, entitled " Silicon Surgical Blades and Method of Manufacture", and U.S. Nonprovisional Patent Application Serial No. 10 / 383,573, filed March 10, 2003, entitled "System and Method for the Manufacture of Surgical Blades", all of the preceding provisional and The entirety of what is expressed in the non-provisional patent appl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/302
Inventor 詹姆斯·休斯瓦迪姆·达斯卡尔约瑟夫·基南埃迪拉·基斯苏珊·查维兹
Owner BEAVER VISITEC INT US
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products