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Film magnetic head and making method thereof

A technology for thin-film magnetic heads and manufacturing methods, applied to magnetic heads and magnetic recording heads using thin films, which can solve problems such as insufficient durability and water corrosion resistance, and achieve fewer manufacturing processes, excellent durability, and strong adhesion strong effect

Inactive Publication Date: 2009-04-22
TDK CORPARATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, the protective film in the above-mentioned gazette was consistent with the technical level at that time, and substantially corresponded to 7nm (70nm ) degree of protective film, so if it is used directly, the durability is not sufficient
In particular, when it is necessary to deal with condensation in the device, etc., corrosion resistance to water is also a problem.

Method used

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  • Film magnetic head and making method thereof
  • Film magnetic head and making method thereof
  • Film magnetic head and making method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] Si(OCH 3 ) 4 and C 2 h 4 Raw material gases as compounds containing Si, C, H, and O were introduced at flow rates of 5 SCCM and 10 SCCM, respectively. Apply RF500W as an alternating current for plasma generation, and form a protective film with a thickness of 2nm on the moving surface or sliding surface of the GMR thin-film magnetic head with a self-bias of -800V under an operating pressure of 0.005 Torr. Take it as sample 1.

[0085] For sample 1, samples 2 to 4 were obtained except that the thickness of the protective film was changed as shown in Table 1.

[0086] In addition, for sample 1, except that the working pressure is 0.05 Torr and the self-bias voltage is -400V, other things are unchanged, and sample 5 is obtained.

[0087] The properties of the samples thus obtained were evaluated as follows, and the evaluation results are shown in Table 1. In addition, the composition measured by the chemical analysis of the formed film was also recorded. The refract...

Embodiment 2

[0099] Si(OCH 3 ) 4 and CH 4 Raw material gases as compounds containing Si, C, H, and O were introduced at flow rates of 5 SCCM and 6 SCCM, respectively. Apply RF500W as an alternating current for generating plasma, and use self-bias -800V or -400V to form a film at a working pressure of 0.005 Torr or 0.05 Torr on the moving surface or sliding surface of the GMR thin film magnetic head. In the same manner as in Example 1, the samples shown in Table 2 were obtained and their characteristics were evaluated, and the evaluation results are shown in Table 2.

[0100]

Embodiment 3

[0102] SiH 4 , CO 2 and CH 4 Raw material gases as compounds containing Si, C, H, and O were introduced at flow rates of 20 SCCM, 10 SCCM, and 50 SCCM, respectively. Apply RF500W as an alternating current for generating plasma, and use self-bias -800V or -400V to form a film at a working pressure of 0.005 Torr or 0.05 Torr on the moving surface or sliding surface of the GMR thin film magnetic head. In the same manner as in Example 1, the samples shown in Table 3 were obtained and their characteristics were evaluated. Table 3 shows the evaluation results.

[0103]

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Abstract

This invention provides a film magnetic head having a protection film at least at the surface opposite to the recording medium, in which, the protection film is expressed by a formula: SiCxHyOzNw, in which, X, Y, Z and W express the atomic ratio, X=3-26, Y=0.5~13, Z=0.5~6, W=0~6, its thickness is 1~3nm, its refractive power is 2.0 or over. This invention also provides a method for manufacturing the protection film and a film head by applying negative bias.

Description

technical field [0001] The present invention relates to various thin films such as MR (Magnetoresistive) magnetic head, GMR (Giant Magnetoresistive) magnetic head, TMR (Tunneling Junction Magnetoresistive) type magnetic head, CPP (Current Perpendicularin plane) type magnetic head, etc. Magnetic head and method of manufacturing the same. Background technique [0002] In recent years, the densification of magnetic recording has progressed. At the same time, as magnetic heads for hard disks, the development of thin-film magnetic heads using soft magnetic thin films as magnetic poles is in vogue. [0003] Among the thin film magnetic heads, there are MR magnetic heads, GMR magnetic heads, TMR or CPP type magnetic heads. [0004] However, the thin-film magnetic head usually floats up on the recording medium supported by the air, so the CSS (Contact Start Stop) method is often used to maintain a small floating amount of about 1-10nm on the high-speed rotating disk. Therefore, t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G11B5/31
Inventor 中山正俊
Owner TDK CORPARATION
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