Silver alloy, sputtering target material thereof, and thin film thereof

A silver alloy, thin film technology, applied in metal material coating process, sputtering coating, vacuum evaporation coating and other directions, can solve the problem of reduced reflectivity, insufficient improvement of sulfidation resistance, and reduced brightness of color liquid crystal displays, etc. problem, to achieve the effect of improved weather resistance, excellent heat resistance, and excellent vulcanization resistance

Active Publication Date: 2008-12-17
FURUYA KINZOKU KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if the reflective electrode film containing the Ag-Pd-Cu-based silver alloy is subjected to the above-mentioned heating process, the growth of surface roughness and the occurrence of protrusions will occur to some extent as described in the comparative example described later, resulting in a decrease in reflectance.
Also, vulcanization is accelerated by heating, and sufficient improvement in vulcanization resistance is not obtained
With the sulfidation of the Ag-Pd-Cu-based silver alloy, the reflective electrode film turns yellow, which reduces the brightness of the color liquid crystal display

Method used

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  • Silver alloy, sputtering target material thereof, and thin film thereof
  • Silver alloy, sputtering target material thereof, and thin film thereof
  • Silver alloy, sputtering target material thereof, and thin film thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0055] 98.7Ag-0.8Pd-0.3Cu-0.2Ge (referring to Ag content: 98.7wt%, Pd content: 0.8wt%, Cu content: 0.3wt%, Ge content: 0.2wt% 。 The following notation is used to indicate the composition of the silver alloy.) The silver alloy sputtering target material. Using this silver alloy sputtering target material, a silver alloy reflective film with the above composition was formed on a quartz glass substrate with a smooth surface by a sputtering method, which was taken as Example 1. The film thickness is 200 nm. The AFM (atomic force microscope, Atomic Force Microscope, SII company, model SPA300HV) image of the film formed is as follows: Figure 4 (a) Shown. At this time, the surface roughness analysis was performed, and Ra (nm) was 1.410, RMS (nm) was 1.785, and P-V (nm) was 14.07. Furthermore, the reflectance of the silver alloy thin film of Example 1 was measured with a spectrophotometer (manufactured by Shimadzu Corporation, model UV-3100PC). The wavelength range used is set to 400-800...

Embodiment 2

[0057] The silver alloy thin film of Example 1 was heat-treated in the air at 250°C for 1 hour. Take this as Example 2. The silver alloy thin film of Example 2 was also observed by AFM in the same manner as in Example 1. The AFM image is shown in Figure 6 (a) In. At this time, the surface roughness analysis was performed, and Ra (nm) was 1.693, RMS (nm) was 2.203, and P-V (nm) was 24.55. Furthermore, in the same manner as in Example 1, the reflectance of the silver alloy thin film of Example 2 was measured. The results are shown in Figure 7 in.

Embodiment 3

[0075] The silver alloy sputtering target material of 98.4Ag-0.8Pd-0.3Cu-0.5Ge was produced by the method shown in the embodiment. Using this silver alloy sputtering target material, a silver alloy reflective film with the above composition is formed on a quartz glass substrate with a smooth surface by a sputtering method. The film thickness is 200 nm. The silver alloy thin film was heated in the air at 250°C for 1 hour. Take this as Example 3. The silver alloy thin film of Example 3 was also observed by AFM in the same manner as in Example 1. The AFM image is shown in Figure 8 (a) In. At this time, the surface roughness analysis was performed, and Ra (nm) was 1.727, RMS (nm) was 2.314, and P-V (nm) was 28.06. Furthermore, in the same manner as in Example 1, the reflectance of the silver alloy thin film of Example 3 was measured. The results are shown in Picture 9 in.

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Abstract

An Ag-Pd-Cu-Ge silver alloy is disclosed which enables to form a reflective electrode film which has such two characteristics at the same time that decrease in the reflectance due to thermal deterioration is extremely small and yellowing due to sulfuration hardly occurs even after the heating step during production of color liquid crystal displays. The silver alloy is characterized by having a chemical composition composed of at least 4 elements wherein Ag is mainly contained, and 0.10-2.89 wt% of Pd, 0.10-2.89 wt% of Cu and 0.01-1.50 wt% of Ge are also contained such that the total content of Pd, Cu and Ge is 0.21-3.00 wt%.

Description

Technical field [0001] The present invention relates to a silver alloy excellent in heat resistance and sulfidation resistance, including a sputtering target material composed of the silver alloy, the silver alloy thin film and the silver alloy paste. In addition, the silver alloy thin film is suitable for applications such as reflective films, reflective electrode films, electrode films, and wiring for displays such as liquid crystal displays and electronic components such as LEDs (light emitting diodes). Furthermore, the silver alloy thin film is also suitable for reflective films and thin semi-transparent films of optical disk media, or reflective films for lighting components such as headlights and projector lamps, and can be used as an electromagnetic wave shielding protective film. Background technique [0002] In the manufacture of a color liquid crystal display, the heating process performed in the assembly of color filters and the like is heated to about 250°C. Therefore...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22C5/06C23C14/34
Inventor 渡边笃
Owner FURUYA KINZOKU KK
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