Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Substrate treating apparatus

a technology of substrate and treating apparatus, which is applied in the direction of phosphorus oxyacids, instruments, inorganic non-surface active detergent compositions, etc., can solve the problems of silicon and other substances deposited in the phosphoric acid, the temperature of the phosphoric acid aqueous solution extracted from the circulating line is lower than in the conventional technique, and the concentration measurement device cannot be provided on the circulating line as in the conventional techniqu

Inactive Publication Date: 2013-10-03
DAINIPPON SCREEN MTG CO LTD
View PDF5 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The invention aims to provide a substrate treating apparatus that can accurately measure the silicon concentration in a phosphoric acid aqueous solution.

Problems solved by technology

It has been found therefore that, when a concentration measuring device using potentiometry is employed, the concentration measuring device cannot be provided on the circulating line as in the conventional technique.
It has also been found that, when the concentration measuring device using potentiometry is employed, the temperature of the phosphoric acid aqueous solution extracted from the circulating line lowers, and there is a possibility that silicon and other substances deposit in the phosphoric acid aqueous solution.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate treating apparatus
  • Substrate treating apparatus
  • Substrate treating apparatus

Examples

Experimental program
Comparison scheme
Effect test

embodiment 1

[0046]Embodiment 1 of this invention will be described hereinafter with reference to a drawing.

[0047]Embodiment 1 will be described taking, as an example, an apparatus for immersing substrates (e.g. semiconductor wafers) having silicon oxide film and silicon nitride film formed thereon in a phosphoric acid aqueous solution produced by mixing phosphoric acid and deionized water, to carry out etching treatment for selectively etching the silicon nitride film.

[0048]FIG. 1 shows an outline construction of a substrate treating apparatus 1 according to Embodiment 1. The substrate treating apparatus 1 has a circulating line 3 for circulating the phosphoric acid aqueous solution. The circulating line 3 includes a treating tank 11, a circulating pump 13, a heater 15 for circulation and a filter 17. The treating tank 11 stores the phosphoric acid aqueous solution. The circulating pump 13 feeds the phosphoric acid aqueous solution under pressure. The heater 15 for circulation heats the phospho...

embodiment 2

[0078]Next, Embodiment 2 of this invention will be described. FIG. 2 is a view showing an outline construction of a substrate treating apparatus 1 according to Embodiment 2. Like reference signs are used to identify like parts which are the same as in Embodiment 1 and will not particularly be described.

[0079]The substrate treating apparatus 1 according to Embodiment 2 includes a quantity measuring station 71 in place of the quantity measuring station 41 in Embodiment 1. The quantity measuring station 71 is connected to piping 37 further branching from the branch pipe 31. The piping 37 branches from the branch pipe 31 in a position on the secondary side of the switch valve 32. The piping 37 has a switch valve 38 mounted in an intermediate position thereof. The branch pipe 31 further includes a switch valve 39 mounted in an intermediate position thereof. The switch valve 39 is disposed adjacent the secondary side of a junction of the branch pipe 31 and piping 37. The other end of the ...

embodiment 3

[0093]Next, Embodiment 3 of this invention will be described. FIG. 3 is a view showing an outline construction of a substrate treating apparatus 1 according to Embodiment 3. Like reference signs are used to identify like parts which are the same as in Embodiments 1 and 2 and will not particularly be described.

[0094]The substrate treating apparatus 1 according to Embodiment 3 includes a branch pipe 91 in place of the branch pipe 31 in Embodiment 1. The branch pipe 91 branches from the circulating line 3, off from the outer tank 23. One end of the branch line 91 is connected to the bottom of the outer tank 23. The other end of the branch line 91 is connected to the quantity measuring station 41.

[0095]The branch pipe 91 has a first pump 92 mounted in an intermediate position thereof for feeding the phosphoric acid aqueous solution. A switch valve 93 is disposed on the secondary side of the first pump 92 and the primary side of the quantity measuring station 41.

[0096]The substrate treat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Concentrationaaaaaaaaaa
Shapeaaaaaaaaaa
Login to View More

Abstract

A substrate treating apparatus includes a circulating line having a treating tank for storing a phosphoric acid aqueous solution, a circulating pump for feeding the phosphoric acid aqueous solution, a heater for circulation for heating the phosphoric acid aqueous solution, a filter for filtering the phosphoric acid aqueous solution, the circulating line causing the phosphoric acid aqueous solution discharged from the treating tank to flow in order of the circulating pump, the heater for circulation and the filter, and returning the phosphoric acid aqueous solution from the filter to the treating tank. The apparatus also includes a branch pipe branching from the circulating line between the heater for circulation and the filter for extracting the phosphoric acid aqueous solution from the circulating line, and a concentration measuring station connected to the branch pipe for measuring silicon concentration in the phosphoric acid aqueous solution by potentiometry.

Description

BACKGROUND OF THE INVENTION[0001](1) Field of the Invention[0002]This invention relates to a substrate treating apparatus for treating semiconductor wafers, substrates for liquid crystal displays, substrates for plasma displays, substrates for organic EL, substrates for FEDs (Field Emission Displays), substrates for optical displays, substrates for magnetic disks, substrates for magnetic optical disks, substrates for photomasks, substrates for solar cells and so on (hereinafter simply called substrates). More particularly, the invention relates a technique of treating substrates by immersing the substrates in a phosphoric acid aqueous solution.[0003](2) Description of the Related Art[0004]Conventionally, this type of apparatus includes a treating tank, a pump, a heater and a filter which constitute a circulating line. The treating tank stores a phosphoric acid aqueous solution, and substrates are immersed in the phosphoric acid aqueous solution for treatment. The phosphoric acid aqu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/306
CPCH01L21/30604H01L21/67086H01L21/67057C01B25/18H01L21/306C11D2111/22C09K13/04C11D7/08G01N15/0656G01N27/4161H01L21/31111
Inventor TAKAHASHI, TOMOHIROARAKI, HIROYUKI
Owner DAINIPPON SCREEN MTG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com