Golf ball
a golf ball and dimple technology, applied in the field of golf balls, can solve the problems of large area, disturbance of air flow, and impair the dimple effect, and achieve the effects of suppressing uneven location of dimples, superior dimple effect, and excellent flight performan
Inactive Publication Date: 2010-07-29
DUNLOP SPORTS CO LTD
View PDF8 Cites 18 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
[0011]In the golf ball, because the number of the units of the pole vicinity region is different from the number of the units of the equator vicinity region, a
Problems solved by technology
This difference disturbs air flow.
Due to this uneven location, a l
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Login to View More
PUM
Login to View More
Abstract
A golf ball 14 has a northern hemisphere N above an equatorial line Eq and a southern hemisphere S below the equatorial line Eq. Each of the northern hemisphere N and the southern hemisphere S has a pole vicinity region 30, an equator vicinity region 32, and a mid region 34. Each of the pole vicinity region 30, the equator vicinity region 32, and the mid region 34 has numerous dimples 20. The dimple pattern of the pole vicinity region 30 includes four units that are rotationally symmetrical to each other about a pole P. The dimple pattern of the equator vicinity region 32 includes six units that are rotationally symmetrical to each other about the pole P. The dimples 20 included in the mid region 34 are arranged along a mid latitude line 28. The number of the dimples 20 included in the mid region 34 is 24.
Description
[0001]This application claims priority on Patent Application No. 2009-15149 filed in JAPAN on Jan. 27, 2009. The entire contents of this Japanese Patent Application are hereby incorporated by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to golf balls. Specifically, the present invention relates to improvement of dimples of golf balls.[0004]2. Description of the Related Art[0005]Golf balls have a large number of dimples on the surface thereof. The dimples disturb the air flow around the golf ball during flight to cause turbulent flow separation. By causing the turbulent flow separation, separation points of the air from the golf ball shift backwards leading to a reduction of drag. The turbulent flow separation promotes the displacement between the separation point on the upper side and the separation point on the lower side of the golf ball, which results from the backspin, thereby enhancing the lift force that acts upon the ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
IPC IPC(8): A63B37/14A63B37/00
CPCA63B37/0004A63B37/0083A63B37/0012A63B37/0017A63B37/0018A63B37/0019A63B37/002A63B37/14A63B37/0021A63B37/0022A63B37/0033A63B37/0036A63B37/0064A63B37/008A63B37/0006A63B37/00065A63B37/00221
Inventor SAJIMA, TAKAHIRO
Owner DUNLOP SPORTS CO LTD
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com