Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Production method for pattern-worked porous molding or nonwoven fabric, and electric circuit components

一种无纺织物、制造方法的技术，应用在电气元件、多孔电介质、印刷电路零部件等方向，能够解决难形成深穿透孔和沟槽等问题，达到低成本的效果

Inactive Publication Date: 2007-02-07
SUMITOMO ELECTRIC IND LTD
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to form deep penetration holes and trenches in high-precision substrates

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Production method for pattern-worked porous molding or nonwoven fabric, and electric circuit components
  • Production method for pattern-worked porous molding or nonwoven fabric, and electric circuit components
  • Production method for pattern-worked porous molding or nonwoven fabric, and electric circuit components

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0079] Porous drawn PTFE (trade name HP010-60, manufactured by SMMITOMO ELECTRIC FINEPOLYMER, INC) with a pore size of 0.1 μm, a porosity (ASTM D-792) of about 50%, and a film thickness of 60 μm was smoothed and set on a glass plate , and secure it with plastic straps around its edges to prevent movement. On the porous drawn PTFE, instant adhesive (trade name Aron Alpha, manufactured by TOAGOSEI Co., Ltd.) was thinly applied. Then, on the instant adhesive layer, a mask made of stainless steel having a slit of 100 μm in width and 5 mm in length opened thereon was provided to have a thickness of 0.05 mm. The membrane was left standing overnight to allow the instant adhesive to dry sufficiently to secure the stainless steel mask to the porous drawn PTFE.

[0080] From above a mask made of stainless steel, the sandblasting process is performed by compressed air using aluminum abrasive grains with an average grain diameter of approximately 5 μm. By transmitted light detection, it...

example 2

[0084] A porous drawn PTFE membrane with a pore size of 5 μm, a porosity of about 80%, and a membrane thickness of 100 μm (trade name WP500-100, manufactured by SMMITOMO ELECTRIC FINE POLYMER, INC.) was smoothed and set on a glass plate, and fixed with adhesive tape in case of movement. An instant adhesive (trade name Aron Alpha, manufactured by TOAGOSEI Co,. Ltd.) was thinly applied on the porous drawn PTFE. Then, on the instant adhesive layer, a mask made of stainless steel in which a slit of 100 μm in width and 5 mm in length was opened was provided to have a thickness of 0.05 mm. The membrane was left standing overnight to allow the instant adhesive to dry sufficiently to secure the stainless steel mask to the porous drawn PTFE.

[0085] From above a stainless steel mask, the sandblasting process is performed by compressed air using aluminum abrasive grains with an average grain diameter of approximately 5 μm. By transmitted light detection, it was confirmed that slit pe...

example 3

[0089] A porous drawn PTFE membrane with a pore size of 5 μm, a porosity of about 80%, and a membrane thickness of 100 μm (trade name WP500-100, manufactured by SMMITOMO ELECTRIC FINE POLYMER, INC.) was smoothed and set on a glass plate, and fixed with an adhesive tape to Anti-movement. An instant adhesive (trade name Aron Alpha, manufactured by TOAGOSEI Co,. Ltd.) was thinly applied on the porous drawn PTFE. Then, on the adhesive layer, a mask made of stainless steel having a slit of 100 µm in width and 5 mm in length opened thereon was provided to have a thickness of 0.05 mm. The membrane was left standing overnight to allow the instant adhesive to dry sufficiently to secure the stainless steel mask to the porous drawn PTFE.

[0090]From above the stainless steel mask, the sandblasting process is carried out by compressed air using sodium chloride abrasive grains with an average grain diameter of approximately 5 μm. The formation of slit-penetrating grooves in the porous d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
porosityaaaaaaaaaa
porosityaaaaaaaaaa
aperture sizeaaaaaaaaaa
Login to View More

Abstract

An object of the present invention is to provide a method for manufacturing a porous material in which complicated and fine through portions, recessed portions, and the like have been patterned. It is to provide a patterned porous molded product or nonwoven fabric, in which a plated layer has been selectively formed on the surfaces of the through portions and the recessed portions. With the invention, a mask having through portions in a pattern is placed on at least one side of the porous molded product or the nonwoven fabric. A fluid or a fluid containing abrasive grains is sprayed from above the mask, thereby to form through portions or recessed portions, or both of them, to which the opening shape of each through portion of the mask has been transferred, in the porous molded product orthe nonwoven fabric. The invention provides a porous molded product or a nonwoven fabric in which a plated layer has been selectively formed on the surfaces of the through portions or the recessed portions, or both of these, an electric circuit component, or the like.

Description

technical field [0001] The present invention relates to a method of manufacturing a porous molded product or nonwoven fabric in which penetrating portions such as penetrating holes and penetrating grooves and recessed portions such as grooves have been patterned. Also, the present invention relates to a manufacturing method of a porous molded product or a nonwoven fabric, wherein a plating layer is selectively formed on the surface of a recessed portion, a penetrating portion, or both by patterning. Furthermore, the invention also relates to circuit elements made of porous molded products or nonwovens with a patterned coating. According to the present invention, the porous molded product or the nonwoven fabric having the patterned plating layer can be preferably applied to technical fields such as semiconductor device mounting members, electrical reliability inspection members, and the like. Background technique [0002] Substrates for fabricating electronic components may ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24C1/04C23C18/16H05K3/10C23C18/22B24C3/32B24C11/00H05K1/00H05K3/18
CPCH05K2201/015H05K2203/0565C23C18/1605C23C18/30H05K2203/025H05K1/0284H05K2201/0209B24C3/322C23C18/1651B24C11/00H05K3/182C23C18/1603H05K3/107H05K2201/0293H05K2201/09118H05K2201/0116H05K2201/09036C23C18/1653H05K3/184C23C18/1644B24C1/04Y10T428/24496Y10T428/24612Y10T428/24479Y10T428/249953Y10T428/249987Y10T442/674C23C18/16H05K3/10
Inventor 林文弘增田泰人奥田泰弘
Owner SUMITOMO ELECTRIC IND LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com