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Fluid treatment system and cleaning apparatus therefor

A technology for liquid treatment and cleaning equipment, which can be used in water/sewage treatment equipment, cleaning methods using liquids, water/sewage treatment, etc., and can solve problems such as leakage of treated liquids

Inactive Publication Date: 2004-07-14
TROJAN TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Alternatively, there will be a possibility of the liquid being treated leaking into the cleaning system

Method used

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  • Fluid treatment system and cleaning apparatus therefor
  • Fluid treatment system and cleaning apparatus therefor
  • Fluid treatment system and cleaning apparatus therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] Before describing the preferred embodiment of the present invention, a brief discussion of prior art seals used in cleaning systems is given.

[0031] refer to figure 1 and figure 2 , shows an enlarged cross-sectional view of a cleaning sleeve 10 that engages with the exterior of a protective sleeve 15 (typically made of quartz) of a radiation source assembly (not shown). The cleaning sleeve 10 is slidably engaged relative to the protective sleeve 15 - see Maarschalkerweerd patent no. 2.

[0032] The cleaning sleeve 10 includes a cleaning chamber 20 filled with a cleaning fluid for removing fouling from the outside of the protective sleeve 15 . The cleaning chamber 20 is sealed from the outside of the cleaning sleeve 10 . exist figure 1 In this case, the cleaning chamber 20 is sealed with respect to the outside of the cleaning sleeve 10 with a pair of O-rings 25,30. exist figure 2 In this case, the cleaning chamber 20 is sealed with respect to the outside of t...

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PUM

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Abstract

A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

Description

[0001] technical field [0002] In one aspect, the invention relates to a cleaning apparatus for use in a liquid handling system. In another aspect, the invention relates to a liquid handling system including a cleaning device. Background technique [0003] Generally, liquid handling systems are well known in the art. [0004] For example, U.S. Patents 4,482,809, 4,872,980, and 5,006,244 (these are all in the name of Maarschalkerweerd and are assigned to the assignee of the present invention, hereinafter referred to as Maarschalkerweerd Patent No. Liquid Handling Systems. [0005] This system consists of an array of UV lamp frames containing several UV lamps, each of which is housed in a sleeve that protrudes from and is supported by a pair of legs connected to a cross member. The sleeve thus supported (containing the UV lamps) is immersed in the liquid to be treated and then irradiates the liquid as required. Depending on the nature of the liquid being treated, the sleev...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/023B08B1/00B08B3/02B08B9/02C02F1/32
CPCC02F1/325C02F2201/324C02F2201/3223B08B9/023B08B1/008Y10S422/906B08B1/30
Inventor 冈·方尤里·劳里辛简·M·马尔斯哈尔克维尔德道格拉斯·彭黑尔
Owner TROJAN TECH
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