Supercharging device for chemical process
A pressurization device and process technology, applied to the parts of the pumping device used for elastic fluid, the cleaning method using gas flow, the cleaning method and the appliance, etc., which can solve the problem of effectively removing and cooling the surface heat of the booster pump The structure is difficult to dissipate heat, consume a lot of time and energy, etc., to reduce the process of manual cleaning, increase the scope of cleaning, and increase efficiency
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[0029] The technical solutions of the present invention will be clearly and completely described below with reference to the embodiments. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0030] see figure 1 and figure 2 As shown, the pressurizing device for chemical process includes a base 2, the top of the base 2 is provided with a pressurizing device 1, the front of the base 2 is provided with a transmission mechanism 4, and the two sides of the transmission mechanism 4 are symmetrically provided with a pressurization device for cleaning The cleaning mechanism 5 of the dust on the surface of the equipment 1, and the bottom of the base 2 is provided with a water cooling mechanism 3 for...
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