Double-layer chiral micro-nano structure and preparation method thereof

A micro-nano structure and chirality technology, applied in optics, instruments, optical components, etc., can solve the problem that the molecular self-assembly laser direct writing method cannot prepare nano-scale structural features, and it is difficult to prepare artificial chiral surface plasmon structures. It is difficult to solve the problem of high difficulty, and achieves the effect of good application prospect, flexible and convenient application, and simplified preparation process steps.

Pending Publication Date: 2022-03-29
XIAN UNIV OF POSTS & TELECOMM
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the preparation of double-layer chiral micro-nano structures, the molecular self-assembly method cannot be completed, and the laser direct writing method cannot prepare nano-sized structural features. This is because the laser wavelength of the laser direct writing method determines the The aggregate size of nanostructures, but the laser wavelength is limited by optical diffraction, it is difficult to prepare nanoscale artificial chiral surface plasmon structures
In the traditional application of electron beam etching method, two times of electron beam etching are required, and overlay etching is required, which is difficult to prepare, takes a long time and costs high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-layer chiral micro-nano structure and preparation method thereof
  • Double-layer chiral micro-nano structure and preparation method thereof
  • Double-layer chiral micro-nano structure and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] The invention provides a double-layer chiral micro-nano structure, such as figure 1 As shown, it includes a substrate, a second noble metal layer, a transparent medium layer, and a first noble metal layer. The transparent medium layer is placed on the substrate, and the material of the substrate is conductive glass, which is convenient for conducting electricity during electron beam etching, so that the charges can be conducted without irregularities in the etched samples caused by charge accumulation. The material of the transparent medium layer is PMMA. The first noble metal layer is placed on the transparent medium layer, and the material of the first noble metal layer is silver or gold. Such as figure 2 As shown, there are L-shaped holes penetrating through the first noble metal layer and the transparent medium layer, that is, the L-shaped holes penetrate the first noble metal layer and the transparent medium layer, and reach the surface of the substrate. The L-...

Embodiment 2

[0035] On the basis of Example 1, the thickness of the nanorods is less than the thickness of the transparent medium layer, so that there is a certain distance between the lower surface of the first noble metal layer and the upper surface of the nanorods, and the distance between the first noble metal layer and the nanorods is applied. The coupling between them produces circular dichroism in the transmitted light. Preferably, the distance between the lower surface of the first noble metal layer and the upper surface of the nanorods is greater than 10 nanometers and less than 240 nanometers, so that the coupling between the thin film and the nanorods can be achieved.

Embodiment 3

[0037] On the basis of Example 2, a double-layer chiral micro-nanostructure with specific morphology parameters was designed, and the transmission spectrum, circular dichroism spectrum and The charge distribution at the resonance mode is used to illustrate and illustrate the core principles of the present invention.

[0038]The material of the first noble metal layer and the second noble metal layer is silver. The transparent medium layer is PMMA. The material of the substrate is conductive glass with a refractive index of 1.45. The thickness of the first noble metal layer is 60 nanometers. The first arm of the hole has a length of 260 nm and a width of 80 nm. The second arm of the hole has a length of 320 nm and a width of 80 nm. The periods of the L-shaped holes are 600 nm and 600 nm. The thickness of the transparent medium layer is 60 nanometers. The thickness of the nanorods is the same as that of the first noble metal layer. The length and width of the nanorods are...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to the field of preparation of chiral micro-nano structures, in particular to a double-layer chiral micro-nano structure and a preparation method thereof.The upper layer is a first precious metal layer provided with L-shaped holes, the lower layer is a second precious metal layer provided with nanorods, different couplings are generated between the L-shaped holes and the nanorods under irradiation of different circular polarized light, and therefore the double-layer chiral micro-nano structure is obtained. Therefore, the resonance intensity is different, and the transmissivity is different, so that the strong circular dichroism is generated. According to the preparation method, the double-layer chiral micro-nano structure can be prepared only through one-time electron beam etching and one-time evaporation of the precious metal material, materials and time are saved, and the preparation process steps are simplified. Besides, dynamic regulation and control of circular dichroism can be realized, secondary evaporation can be carried out on the basis of the structure, regulation and control of the thickness of a structural film and the thickness of the nanorod are realized, application is flexible and convenient, and the method has a good application prospect in the field of preparation of chiral micro-nano structures.

Description

technical field [0001] The invention relates to the field of preparation of chiral micro-nano structures, in particular to a double-layer chiral micro-nano structure and a preparation method thereof. Background technique [0002] The artificial chiral surface plasmon micro-nanostructure has a stronger interaction with light, and has important applications in many fields such as analytical chemistry, biosensing, and circular polarization devices. [0003] At present, the technologies for preparing artificial chiral surface plasmon micro-nano structures mainly include electron beam etching, laser direct writing, and molecular self-assembly. Electron beam etching can be used to prepare planar artificial chiral surface plasmon micro-nanostructures with high precision. Laser direct writing can be used to prepare micron-scale three-dimensional artificial chiral surface plasmonic micro-nanostructures, such as helical or tapered metal helices. The molecular self-assembly method li...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/30G02B1/08
CPCG02B5/3041G02B5/3058G02B1/08
Inventor 王勇凯白瑜张霄桐董军郑益朋
Owner XIAN UNIV OF POSTS & TELECOMM
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap