Self-cleaning device of evaporation table for semiconductor processing
An evaporation table and self-cleaning technology, which is applied in the direction of vacuum evaporation plating, metal material coating process, coating, etc., can solve the problems of inconvenient cleaning and easy residual cleaning dead ends, so as to avoid abrasion, avoid residual cleaning dead ends, and good The effect of cooling effect
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[0029] like Figure 1 to Figure 6 As shown in the figure, a self-cleaning device for an evaporation table for semiconductor processing according to the present invention includes an evaporation table body 1, a moving structure 2, an installation chassis 3, a lifting cylinder 4, an electric base 5, a vertical beam frame 6, a cleaning Structure 7 and dust removal structure 8, a moving structure 2 is arranged on the outside of the evaporation table body 1, one end of the moving structure 2 is installed with a mounting chassis 3, and a lifting cylinder 4 is installed in the center of the end face of the mounting bottom bracket 3, and the top of the lifting cylinder 4 is above the top An electric base 5 is provided, a vertical beam frame 6 is fixedly installed in the center of the top end face of the electric base frame 5, a cleaning structure 7 is arranged on one side of the end face of the vertical beam frame 6, and a dust removal structure 8 is arranged above the end face of the ...
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