Monitoring wafer and monitoring system

A monitoring system and wafer technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as pollution and low maintenance efficiency, and achieve the effect of ensuring accuracy

Pending Publication Date: 2022-02-18
CHANGXIN MEMORY TECH INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to ensure that the environment in the reaction chamber or the performance of the reaction chamber meets the requirements, the existing technology usually opens the reaction chamber regularly for manual maintenance, but this may introduce other pollution and the efficiency of maintenance is low

Method used

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  • Monitoring wafer and monitoring system
  • Monitoring wafer and monitoring system
  • Monitoring wafer and monitoring system

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Embodiment Construction

[0024] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. However, those skilled in the art can understand that in each embodiment of the present invention, many technical details are provided for readers to better understand the present application. However, even without these technical details and various changes and modifications based on the following embodiments, the technical solutions claimed in this application can also be realized.

[0025] refer to figure 1 , the monitoring wafer comprises: initial wafer 10, initial wafer 10 has front and back 101, and back 101 faces wafer chuck (not shown); Wireless transmission module 13 and the camera module 11 and data acquisition that are positioned at back 101 Module 12, the search module 11 is used to send search light to the wafer chuck, the...

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Abstract

The embodiment of the invention provides a monitoring wafer and a monitoring system, and the monitoring wafer comprises: an initial wafer which is provided with a front surface and a back surface, and the back surface faces a wafer chuck; the searchlighting module, the data acquisition module and the wireless transmission module that are located on the back face, where the searchlighting module is used for emitting searchlighting rays to the wafer chuck, the data acquisition module is used for acquiring searchlighting information of the searchlighting rays on the wafer chuck, and the wireless transmission module is used for receiving and transmitting the searchlighting information. According to the invention, the conditions of the wafer chuck and the reaction chamber can be accurately obtained.

Description

technical field [0001] Embodiments of the present invention relate to the field of semiconductors, and in particular to a monitoring wafer and a monitoring system. Background technique [0002] In the monolithic reaction process of semiconductor structures, a plurality of wafers will sequentially pass through the same reaction chamber for corresponding processes. When the process of any wafer pollutes the environment in the reaction chamber or affects the performance of the reaction chamber, the process of the subsequent wafer or the quality of the manufactured semiconductor structure will be affected. [0003] In order to ensure that the environment in the reaction chamber or the performance of the reaction chamber meets the requirements, in the prior art, the reaction chamber is usually opened regularly for manual maintenance, but this may introduce other pollution and the maintenance efficiency is low. Contents of the invention [0004] The embodiment of the present in...

Claims

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Application Information

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IPC IPC(8): H01L21/67
CPCH01L21/67242H01L21/67
Inventor 张博维潘磊傅荣
Owner CHANGXIN MEMORY TECH INC
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