Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Single line diagram layout inspection method and device based on statistical abnormal point detection algorithm

A layout inspection and detection algorithm technology, which is applied in the direction of calculation, circuit device, computer aided design, etc., can solve the problems that the normative one-line diagram experience cannot be inherited, borrowed, difficult and heavy workload, and it is difficult to meet the development and use of smart grid. , to achieve the effect of good promotion and application value

Pending Publication Date: 2022-01-28
GUIZHOU POWER GRID CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The one-line diagram is one of the important tools for the operation and maintenance of distribution network equipment. The difficulty and workload of manual drawing and drawing software are relatively large. In the case of increasing complexity of the power grid structure, it is difficult to meet the intelligent In order to meet the requirements of the development and use of the power grid, the power grid company, on the basis of the unified grid GIS platform and based on the localization characteristics, has compiled the detailed rules for the production and dispatching application of single-line diagrams of distribution lines applicable to the unit, and refined the one-line diagrams. specification
[0003] However, drawing specifications are aimed at individual drafters and one-line diagrams, and the experience of normative one-line diagrams cannot be inherited and used for reference.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Single line diagram layout inspection method and device based on statistical abnormal point detection algorithm
  • Single line diagram layout inspection method and device based on statistical abnormal point detection algorithm

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood that the preferred embodiments are only for illustrating the present invention, but not for limiting the protection scope of the present invention.

[0043] Such as figure 1 As shown, a method for checking the layout of a one-line diagram based on a statistical outlier detection algorithm of the present invention includes:

[0044] Step S1: Learning of typical layout samples; specifically, learning the typical layout of typical sample one-line diagrams one by one, and writing the results of layout statistical probability distribution into the learning result database, including:

[0045] Set the selection range of the specified sample learning;

[0046] Set the threshold for abnormal points exceeding the limit;

[0047] Analyze the sample data one by one to learn the typical layout characteristics of the sample; ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a single line diagram layout inspection method and device based on a statistical abnormal point detection algorithm. The method comprises the steps of S1, typical layout sample learning; s2, layout instance detection; and S3, displaying and outputting a layout detection result. According to the method and the device, from the perspective of machine learning, the typical single line diagram is taken as a blueprint, a virtuous circle is formed through machine learning, judgment of layout rationality of other newly added and adjusted single line diagrams and an empirical learning mode, single line diagram layout detection is guided, and the method and the device have good popularization and application values.

Description

technical field [0001] The invention relates to the technical field of computer and distribution network single-line diagram processing, in particular to a single-line diagram layout inspection method and device based on a statistical abnormal point detection algorithm. Background technique [0002] The one-line diagram is one of the important tools for the operation and maintenance of distribution network equipment. The difficulty and workload of manual drawing and drawing software are relatively large. In the case of increasing complexity of the power grid structure, it is difficult to meet the intelligent In order to meet the requirements of the development and use of the power grid, the power grid company, on the basis of the unified grid GIS platform and based on the localization characteristics, has compiled the detailed rules for the production and dispatching application of single-line diagrams of distribution lines applicable to the unit, and refined the one-line dia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/18H02J13/00G06F113/04
CPCG06F30/18H02J13/00001G06F2113/04Y04S10/40
Inventor 纪元袁捷朱州钱俊凤舒彧陈卿冯光璐戴建丽孔庆波缪新萍李飞郭仁超熊志文
Owner GUIZHOU POWER GRID CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com