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Oxide rotating target material and preparation method thereof

A technology of rotating target and oxide, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of increasing the production cost of high-mobility oxide target material, low sputtering utilization rate of planar target material, Target high cost and other issues, to achieve high film carrier mobility, improve carrier mobility, and high use value

Inactive Publication Date: 2021-12-24
XIANDAO THIN FILM MATERIALS GUANGDONG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology improves the performance of ceramic targets used for manufacturing electronic devices such as thin films on semiconductor wafers or substrates made from them. By adjusting certain parameters like particle size distribution (PCD) and crystal structure, these improvements result in improved properties that make it easier to use this type of material over conventional materials without losing their effectiveness due to reduced resistance when they rotate around inside cylindrical containers called tube holdings. Additionally, there has been some research showing how adding different elements could further enhance its characteristics compared to traditional methods. Overall, this new technique allows for efficient utilization of resources within various industries including electronics industry.

Problems solved by technology

This patented technical solution describes improving the efficiency and effectiveness of producing highly mobile oxides (MOS) on various substrates such as silica glass due to its ability to transport oxygen atoms within it while also being able to increase their concentration compared to traditional methods like vacuum evaporation techniques. Additionally, this method allows for efficient use of expensive raw materials without losing them altogether because they may then become more valuable products after processing.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A method for preparing an oxide rotating target, comprising the steps of:

[0029] (1) Mix 3.62kg praseodymium oxide powder, 19.95kg gallium oxide powder, 17.32kg zinc oxide powder and 59.1kg indium oxide powder, add 6.6kg dispersant, 13.44kg binder, 53.74kg water and defoamer at 1000rpm Ball milling for 14 hours at a rotating speed of 1 / min to obtain a mixed slurry;

[0030] (2) Spray granulation, mixing and sieving the mixed slurry to obtain a powder for target conversion of oxides with an average particle size of 55 μm;

[0031] (3) Introduce the powder for oxide target material into the mold for cold isostatic pressing to obtain the rotating target body; the outer diameter of the produced rotating target body is 170mm, inner diameter is 152mm and the height is 600mm;

[0032] (4) Degreasing the target body, cooling it to room temperature, and then sintering it to obtain the oxide rotating target; the temperature of the degreasing heat treatment is 500°C, the ti...

Embodiment 2

[0035] A method for preparing an oxide rotating target, comprising the steps of:

[0036] (1) Mix 3.62kg praseodymium oxide powder, 16.29kg gallium oxide powder, 24.8kg zinc oxide powder and 54.3kg indium oxide powder, add 5.48kg dispersant, 10.98kg binder, 21.07kg water and defoamer at 1000rpm Ball milling for 12 hours at a rotating speed of 1 / min to obtain a mixed slurry;

[0037] (2) Spray granulating, mixing and sieving the mixed slurry to obtain a powder for converting an oxide target material with an average particle size of 26 μm;

[0038] (3) Introduce the powder for oxide target material into the mold for cold isostatic pressing to obtain the rotating target body; the outer diameter of the produced rotating target body is 168mm, inner diameter The length is 149mm and the height is 596mm;

[0039] (4) Degreasing the target green body, cooling it to room temperature, and then sintering it, and obtaining the oxide rotating target after natural cooling; the temperatu...

Embodiment 3

[0042] A method for preparing an oxide rotating target, comprising the steps of:

[0043] (1) Mix 3.62kg praseodymium oxide powder, 23.53kg gallium oxide powder, 14.48kg zinc oxide powder and 72.4kg indium oxide powder, add 6.5kg dispersant, 13kg binder, 192.27kg water and defoamer at 800rpm / Mixed slurry was obtained by ball milling for 20 hours at min speed;

[0044] (2) Spray granulation, mixing and sieving the mixed slurry to obtain a powder for converting an oxide target material with an average particle size of 73 μm;

[0045](3) Introduce the powder for oxide target material into the mold for cold isostatic pressing to obtain the rotating target body; the outer diameter of the produced rotating target body is 173mm, inner diameter is 146mm, and the height is 603mm;

[0046] (4) Degreasing the target green body, cooling it to room temperature, and then sintering it. After natural cooling, the oxide rotating target is obtained; the temperature of the degreasing heat ...

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Abstract

The invention discloses an oxide rotating target material and a preparation method thereof. The preparation method comprises the following steps: (1) mixing praseodymium oxide powder, gallium oxide powder, zinc oxide powder and indium oxide powder, adding a dispersing agent, a binding agent, water and a defoaming agent, and carrying out ball milling to obtain mixed slurry; (2) carrying out spray granulation on the mixed slurry to obtain powder for the oxide rotating target material; (3) guiding the powder for the oxide rotating target material into a mold, and performing cold isostatic pressing forming to obtain a target material green body; and (4) carrying out degreasing heat treatment on the target material green body, cooling to normal temperature, then carrying out sintering treatment, and naturally cooling to obtain the oxide rotating target material. On one hand, praseodymium oxide is doped with indium gallium zinc oxide, so that the carrier mobility of the target material is improved, and the resistivity of the target material is reduced; and on the other hand, the tubular oxide rotating target material is prepared through the method, the sputtered oxide film is better in uniformity and stability, recycling is more economical, and the carrier mobility of the film is high.

Description

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Claims

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Application Information

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Owner XIANDAO THIN FILM MATERIALS GUANGDONG CO LTD
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