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Photoetching device and photoetching method based on robot

A robot and lithography technology, applied in the field of lithography, can solve problems such as difficult relative positions and difficult to meet lithography requirements, and achieve the effect of meeting lithography requirements

Pending Publication Date: 2021-12-14
SHENZHEN UNIV +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The current lithography equipment usually fixes the light source and the workpiece to be exposed, and it is difficult to adjust the relative position of the two in real time. In addition, it is difficult to meet the requirements of lithography for workpieces with complex structures and shapes.

Method used

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  • Photoetching device and photoetching method based on robot

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Embodiment Construction

[0023] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention.

[0024] Please refer to figure 1 , an embodiment of the present invention provides a lithography apparatus based on a robot 20 , including a robot 20 , a light source 30 and a workbench 40 .

[0025] The robot 20 has degrees of freedom in at least two directions, and the robot 20 is opposite to the workbench 40 . One of the light source 30 and the tape exposure workpiece 50 is arranged on the robot 20, and the other is arra...

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Abstract

The invention discloses a photoetching device and a photoetching method based on a robot. The photoetching device comprises the robot, a light source and a workbench, wherein the robot has degrees of freedom in at least two directions, and the robot is opposite to the workbench; one of the light source and a to-be-exposed workpiece is arranged on the robot, and the other is arranged on the workbench; and the robot is used for moving in at least one direction according to the shape of the to-be-exposed workpiece, so that the light source exposes multiple areas of the to-be-exposed workpiece. During photoetching, the robot can drive one of the light source and the to-be-exposed workpiece to move relative to the other one, so that the light source can expose different areas of the to-be-exposed workpiece respectively, the to-be-exposed workpiece with a complicated and changeable structure and shape can be well exposed, the relative position of the light source and the to-be-exposed workpiece can be adjusted in real time, and the photoetching requirements of workpieces with complex structures and appearances can also be met.

Description

technical field [0001] The invention relates to the technical field of lithography, and in particular to a robot-based lithography device and a lithography method. Background technique [0002] The current lithography equipment usually fixes the light source and the workpiece to be exposed, and it is difficult to adjust the relative position of the two in real time. In addition, it is difficult to meet the lithography requirements for workpieces with complex structures and shapes. Contents of the invention [0003] The purpose of the present invention is to provide a robot-based lithography device and lithography method, which can adjust the relative position of the light source and the workpiece to be exposed in real time, and can also meet the lithography requirements for workpieces with complex structures and shapes. [0004] For realizing the purpose of the present invention, the present invention provides following technical scheme: [0005] In a first aspect, the pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00
CPCG03F9/7053
Inventor 郭登极王序进胡作寰高国利贾建飞林建军刘宇航尹覃伟
Owner SHENZHEN UNIV
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