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Photoetching machine parameter state detection method and device, equipment and storage medium thereof

A state detection and lithography machine technology, applied in the field of lithography machines, can solve problems such as low efficiency, affecting the quality of mask plate graphics, and motor lost steps, and achieve the effect of avoiding batch scrapping

Active Publication Date: 2021-11-26
深圳市龙图光罩股份有限公司
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  • Claims
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Problems solved by technology

[0002] The lithography machine is one of the key equipment in the production and manufacturing process of integrated circuits. In the continuous working state of the lithography machine, due to environmental influences such as external temperature, humidity, and purification degree, and because there are many linked parts during work, it is easy to appear A series of faults such as motor loss, optical path deviation, energy attenuation, etc., will affect the image quality of the reticle
[0003] At present, when checking the graphic quality of the lithography machine, it is mainly by tracking the parameter changes of each component of the equipment or by the engineer to detect each equipment instrument when the machine is shut down. batch scrapping

Method used

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  • Photoetching machine parameter state detection method and device, equipment and storage medium thereof
  • Photoetching machine parameter state detection method and device, equipment and storage medium thereof
  • Photoetching machine parameter state detection method and device, equipment and storage medium thereof

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[0041] The application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain related inventions, rather than to limit the invention. It should also be noted that, for ease of description, only parts related to the invention are shown in the drawings.

[0042] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.

[0043] Please refer to figure 1 , figure 1 It shows a method for detecting a state of a lithography machine parameter provided by an embodiment of the present application, and the method includes at least the following steps:

[0044] Step 110: Obtain various working parameters of the photolitho...

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Abstract

The invention discloses a photoetching machine parameter state detection method and device, equipment and a storage medium thereof. The method comprises the following steps: acquiring various working parameters of a photoetching machine during working; converting various working parameters into corresponding working graphical interfaces and quantified; comparing the deviation between the working graphical interface and the corresponding normal graphical interface, and if the deviation is within a preset range, determining that the index of the photoetching machine during working is qualified; and if the deviation exceeds the preset range, determining that the photoetching machine in working has a fault. According to the technical scheme provided by the invention, the various working parameters of the photoetching machine during working are converted into the corresponding working graphical interface, and whether each parameter of the photoetching machine is abnormal or not is judged according to the working graphical interface, so that the change of each parameter state of the equipment is more intuitively compared; problems that a traditional mode depends on engineer shutdown inspection and equipment and instrument detection is low in timeliness are solved, and batch scrapping of products caused by untimely tracking of equipment parameter changes is avoided.

Description

technical field [0001] The present invention relates to the technical field of lithography machines, in particular to a method, device, equipment and storage medium for detecting the state of parameters of a lithography machine. Background technique [0002] The lithography machine is one of the key equipment in the production and manufacturing process of integrated circuits. In the continuous working state of the lithography machine, due to the environmental influence of external temperature, humidity, purification degree, etc., and because there are many linked parts during work, it is easy to appear A series of failures such as motor step loss, optical path deviation, and energy attenuation will affect the image quality of the reticle. [0003] At present, when checking the graphic quality of the lithography machine, it is mainly by tracking the parameter changes of each component of the equipment or by the engineer to detect each equipment instrument when the machine is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70483G03F7/7085
Inventor 叶小龙侯广杰谢超王栋
Owner 深圳市龙图光罩股份有限公司
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