A kind of preparation method of Faraday cage

A Faraday cage and concentric ring technology, which is applied in semiconductor/solid-state device manufacturing, discharge tubes, electrical components, etc., can solve the problems of not too large opening density, high cost, slow speed, etc., and achieve good design reduction, Easy to adjust, highly symmetrical effect

Active Publication Date: 2022-04-12
BEIJING NORMAL UNIVERSITY
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  • Abstract
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Problems solved by technology

Although micro-milling can produce uniform cages, and the size of holes can be designed according to needs, but because it is micron-precision machining, the cost is high and the speed is slow, and the cage needs to maintain a certain rigidity during processing, which is inversely In the past, the opening density cannot be too large, or the cage material must maintain a certain thickness
These disadvantages limit the flexibility and processing speed of the etching process

Method used

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  • A kind of preparation method of Faraday cage
  • A kind of preparation method of Faraday cage
  • A kind of preparation method of Faraday cage

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Embodiment Construction

[0015] The present invention will be further described in detail with reference to the accompanying drawings and embodiments.

[0016] The preparation method of a Faraday cage provided by the present invention mainly includes two parts. The first part is to design and process the two-dimensional graphics of the planar material, and the second part is to stretch the processed planar material into a three-dimensional shape to obtain the Faraday cage.

[0017] In the first step, according to the parameters of the Faraday cage to be processed, the planar structure of the two-dimensional figure is designed, and the planar material is processed into the corresponding planar structure.

[0018] Such as figure 1 As shown, the two-dimensional image of the planar material designed in the embodiment of the present invention is a circle as a whole, wherein the black part indicates that there is material, the center part and the outer ring part of the image are filled with solid materials,...

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Abstract

The invention provides a method for preparing a Faraday cage, which belongs to the technical field of micro-nano processing. According to the Faraday cage to be processed, the method of the invention appropriately designs the two-dimensional figure of the plane material, and stretches the plane structure to three dimensions, thereby realizing the preparation of the Faraday cage. The planar structure designed by the present invention is a circle as a whole, including: a central circular area and an outer annular area, and a plurality of concentric rings are arranged in the area between the center and the outer ring, and each adjacent concentric ring is arranged There are multiple interannular lines; the center and outer rings are solid filled with material, the concentric rings and interannular lines are also solid material, and the other areas are hollowed out. The invention can prepare a small Faraday cage with high symmetry and high repeatability, can be used to process micro-nano structures with highly uniform dimensions in batch production, and has low manufacturing cost.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and in particular relates to a preparation method of a Faraday cage. Background technique [0002] A Faraday cage is a metal enclosure that prevents electromagnetic fields from entering or escaping. It is a cage formed of metal or a good conductor. In the prior art, in the process of reactive ion etching, the trajectory of ions can be changed by using a Faraday cage, so as to realize the preparation of three-dimensional devices. Research on the use of Faraday cages during ion etching to enhance etch directionality began in 1980. In 2012, the Loncar group of Harvard University improved this method to process self-supporting photonics and mechanical micro-nano structures on bulk substrates, and applied for a US patent, the patent number is US8999105B2. In 2017, the US patent US9659797B1 proposed that the batch production of micro-nano devices can be realized by using multiple unifor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H01L21/3065B82Y40/00
CPCH01J37/32H01L21/3065B82Y40/00
Inventor 王川米丝辰
Owner BEIJING NORMAL UNIVERSITY
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