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Arc ion coating device and coating method

A coating device and arc ion technology, applied in the field of vacuum coating, can solve the problems of restricting large batches, large-scale promotion and application, uneven film thickness and height, and small effective range of coating, etc., to achieve size increase, consumption resistance, and extension Effect of replacement cycle

Pending Publication Date: 2021-10-29
JIANGSU XCMG CONSTR MASCH RES INST LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The cathode of the existing pulsed arc power supply is mostly a flat circular target, and the size of the target is relatively small The replacement cycle is short, and the arc starter is fixed at one position, which can only generate a limited area of ​​vacuum arc on the flat circular target. The effective range of coating is small and the thickness of the film prepared within the effective range is highly uneven.
The above problems limit the large-scale and large-scale promotion and application of this coating method in the industrial field

Method used

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  • Arc ion coating device and coating method

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Embodiment Construction

[0057] The following will clearly and completely describe the technical solutions in the embodiments of the present disclosure with reference to the accompanying drawings in the embodiments of the present disclosure. Apparently, the described embodiments are only some of the embodiments of the present disclosure, not all of them. The following description of at least one exemplary embodiment is merely illustrative in nature and in no way intended as any limitation of the disclosure, its application or uses. Based on the embodiments in the present disclosure, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present disclosure.

[0058] Techniques, methods and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, techniques, methods and devices should be considered part of the description.

[0059]In the description of the present d...

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Abstract

The invention relates to an arc ion coating device and a coating method. The arc ion coating device comprises a vacuum chamber, an arc generation component, a supporting frame and a power supply component. A cavity of the vacuum chamber is a vacuum environment. The arc generation component is arranged in the vacuum chamber and comprises a cathode target, an anode and an arc starter, the cathode target is columnar and is used for releasing plasma, and the arc starter is arranged between the cathode target and the anode and is used for generating charged particles so as to guide an arc generated between the side face of the cathode target and the anode to perform coating on a workpiece. The supporting frame is arranged in the vacuum chamber, is arranged on one side, far away from the cathode target, of the anode and is used for placing the workpiece. The power supply component comprises an arc power supply and a first energy accumulator, the arc power supply is provided with a first output end and a second output end, the first output end is used for outputting pulse voltage and is connected with the arc starter, the second output end is used for outputting adjustable direct-current voltage and is used for charging the first energy accumulator, and the cathode and the anode of the first energy accumulator are connected with the cathode target and the anode correspondingly.

Description

technical field [0001] The disclosure relates to the technical field of vacuum coating, in particular to an arc ion coating device and a coating method. Background technique [0002] The pulsed arc power supply adopts pulsed and intermittent high-current discharge (≥2000A). The heat generated by the arc discharge on the surface of the cathode target will be fully taken away by the cooling water in the discharge gap, so it can avoid the liquid droplets produced by the local tiny melting of the cathode from affecting the film. Quality, is widely used in plating metal film, alloy film and carbon-based film. [0003] The cathode of the existing pulsed arc power supply is mostly a flat circular target, and the size of the target is relatively small The replacement cycle is short, and the arc starter is fixed at one position, which can only generate a limited area of ​​vacuum arc on the flat circular target. The effective range of coating is small and the thickness of the film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/54
CPCC23C14/325C23C14/54H01J37/32055H01J37/32614H01J37/32064H05H2245/40H05H1/48H05H1/54
Inventor 冯森蹤雪梅李莎郭飞
Owner JIANGSU XCMG CONSTR MASCH RES INST LTD
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