Dual-laser interference nanoscale positioning measurement system

A positioning measurement, nano-scale technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as signal acquisition and demodulation difficulties, and achieve the effect of improving resolution

Active Publication Date: 2021-09-21
NAT INST OF METROLOGY CHINA
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But at the same time, the number of interference fringes in the vector vortex light field is more than that in the scalar light field, and the signal acquisition and demodulation is more difficult
[0003] At present, there is still a lack of an optical system that uses the vector vortex light field and the scalar light field to measure the nanometer displacement, thereby effectively improving the measurement resolution of the interferometer and realizing the fast acquisition and demodulation of the interference signal.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Dual-laser interference nanoscale positioning measurement system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0047] The purpose of the present invention is to provide a dual-laser interference nanoscale positioning measurement system, which aims to improve the measurement resolution and realize fast acquisition and demodulation of interference signals, which can be applied to the technical field of displacement measurement.

[0048] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a dual-laser interference nanoscale positioning measurement system which comprises a light source, a first beam splitter prism, a first rectangular prism, a second rectangular prism, a second beam splitter prism, a scalar interference light acquisition module, a vector interference light acquisition module and a displacement calculation module. A photoelectric detector collects the light intensity of reflected interference light in the position moving process of an object to be detected and generates a periodic light intensity change curve, and a CCD camera collects vortex interference photoelectric images before and after the position of the object to be detected moves. The displacement of the to-be-detected problem is calculated according to the integer period of the light intensity change curve and the change angle of the image of the vortex interference light before and after the position of the to-be-detected object is moved, the reflection interference light collected by the photoelectric detector is a scalar signal, the vortex interference light collected by the CCD camera is a vector signal, and the displacement is calculated comprehensively by combining the two signals. And the measurement resolution is improved, and meanwhile, the interference signals are quickly acquired and demodulated.

Description

technical field [0001] The invention relates to the technical field of displacement measurement, in particular to a dual-laser interference nanoscale positioning measurement system. Background technique [0002] The micro-nano displacement measurement technology based on the principle of laser interferometry is currently the most commonly used micro-nano displacement measurement method. After the Michelson interferometer was used for experiments for the first time, the interferometer has developed rapidly and has been widely used in measurement fields such as length, angle, and microscopic shape. At present, most researches on displacement measurement based on laser interferometer focus on the improvement of measurement resolution and stability. Ordinary scalar light field interference signal has the advantage of obvious bright and dark boundaries of interference fringes, but compared with vortex light field interference signal, it has the disadvantage of lacking a referenc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02
CPCG01B11/02
Inventor 张树施玉书王芳皮磊卜祥鹏
Owner NAT INST OF METROLOGY CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products