Tail gas emission structure and reduction furnace

Abstract

The invention discloses a tail gas emission structure and a reduction furnace. The tail gas emission structure comprises a plurality of tail gas branch tubes, wherein the first end of each tail gas branch tube communicates with a converging tube, and the first ends of the multiple tail gas branch tubes are arranged in the circumferential direction of the converging tube at intervals; the first end of a collecting tube communicates with the converging tube; and the second end of the collecting tube communicates with one end of a tail gas mother tube. The tail gas emission structure can be applied to a reduction furnace, and the second ends of the tail gas branch tubes can communicate with an exhaust hole in the bottom of the reduction furnace, so that tail gas in the reduction furnace enters the tail gas branch tubes through the exhaust hole, and gas in the tail gas branch tubes can be balanced in the converging tube after entering the converging tube, and thus, pressure flow of the gas in the converging tube is more uniform and stable; and uniform and stable gas in the converging tube stably flows into the collecting tube, passes through the collecting tube and then is discharged from the tail gas mother tube, so that the tail gas is discharged more uniformly and stably, the pressure, the flow fields and the temperature fields in the reduction furnace are stable, and the production quality of polycrystalline silicon is improved.

Description

technical field [0001] The application belongs to the technical field of polysilicon, and in particular relates to a tail gas discharge structure and a reduction furnace. Background technique [0002] Polysilicon is the main raw material for manufacturing integrated circuits and solar cells. In the production process of polysilicon, raw materials such as chlorosilane and hydrogen are sent into the reduction furnace to produce polysilicon by chemical vapor deposition on the silicon rods. The deposition speed on the surface will continuously inject the raw material gas through the nozzle, and at the same time, the low concentration of chlorosilane after the reaction and the by-products in the reaction process will be continuously discharged through the tail gas port. When the tail gas flows through the tail gas pipe, the gas pressure flow in the tail gas pipe is not uniform and stable, resulting in unstable pressure, flow field, and temperature field in the reduction furnace,...

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Problems solved by technology

[0003] The purpose of the embodiment of the present application is to provide a tail gas discharge structure and a reduction furnace to solve the uneven and stable gas pressure and flow in the tail gas pipe of the reduction furnace, which leads to unstable pressure, flow field and temperature field in the reduction furnace, which affects polysilicon. production quality issues

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