Metamaterial modulator
A technology of modulators and metamaterials, which is applied in the direction of instruments, antennas, electrical components, etc., can solve the problems of single modulation performance and insufficient flexibility of modulation effects, and achieve the effects of high modulation depth, rich and flexible modulation, and wide modulation bandwidth
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Embodiment 1
[0056] like figure 1 As shown, the embodiment of the present invention provides a metamaterial modulator, which includes a surface layer 1, a graphene layer 2, a first flexible dielectric layer 3, a perovskite layer 4, and a metal structure arranged from top to bottom. layer 5, second flexible dielectric layer 6 and underlying substrate layer 7;
[0057] Wherein, the second flexible dielectric layer 6 is attached to the upper surface of the underlying substrate layer 7, the metal structure layer 5 is attached to the upper surface of the second flexible dielectric layer 6, the perovskite layer 4 covers the metal structure layer 5, and the first flexible dielectric layer 3 Attached to the upper surface of the perovskite layer 4 , the graphene layer 2 is attached to the upper surface of the first flexible dielectric layer 3 , and the surface layer 1 is attached to the upper surface of the graphene layer 2 .
[0058] This metal structure layer 5 is made up of several metal struct...
Embodiment 2
[0078] like Figure 7 As shown, the embodiment of the present invention provides a method for preparing a metamaterial modulator, the method comprising:
[0079] S1. Prepare a layer of high-resistance silicon layer as the underlying substrate layer 7 .
[0080] Prepare a layer of 500 μm thick high-resistance silicon layer.
[0081] S2, polyimide is spin-coated on the underlying substrate layer 7, and the specific steps include:
[0082] Spin-coat 10 μm thick polyimide film on 500 μm high-resistance silicon: After cleaning the prepared high-resistance silicon, spin-coat a polyimide solution with a viscosity of 3600 (centipoise) on the polished surface, and the spin-coating time is 60 seconds at 2200RPM. Then the polyimide solution is baked, the baking temperature is 120° C., 200° C. and 230° C. for 1 hour respectively, and then the baking is continued for 2 hours at 250° C.
[0083] S3. Spin-coat photoresist on the polyimide, and prepare the metal structure layer 5 by using a...
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