Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An ultra-high-precision plane mirror full-aperture intermediate-frequency surface shape measurement device and method

A technology of measuring devices and plane mirrors, which is applied in the direction of measuring devices, optical devices, instruments, etc., to achieve the effects of eliminating position errors, improving splicing measurement accuracy, and simple equipment

Active Publication Date: 2022-06-28
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of full-aperture intermediate frequency detection of ultra-high-precision plane mirrors, the present invention proposes a full-aperture intermediate-frequency surface shape measurement device and method for ultra-high-precision plane mirrors

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An ultra-high-precision plane mirror full-aperture intermediate-frequency surface shape measurement device and method
  • An ultra-high-precision plane mirror full-aperture intermediate-frequency surface shape measurement device and method
  • An ultra-high-precision plane mirror full-aperture intermediate-frequency surface shape measurement device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057] In order to further illustrate the features of the present invention, the following description is given in conjunction with specific embodiments and the accompanying drawings.

[0058] figure 1 Shown is the ultra-high-precision plane mirror full-aperture intermediate-frequency surface measurement device in the present invention, including: a marble base 1, a lifting device 2, an axial displacement stage 3, a tilt adjustment stage 301, a white light interferometer 4, a microscope objective lens 401, a short Standard plane mirror 5, ultra-high-precision plane mirror 6, long standard plane mirror 7, first autocollimator 8, computer system 9 and second autocollimator 10; wherein, the white light interferometer 4 is installed on the lifting device 2, and is connected with The axial displacement stage 3 is fixed on the marble base 1 to isolate errors caused by environmental factors; the tilt adjustment stage 301 is installed on the axial displacement stage 3 to realize the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a device and method for measuring the full-aperture intermediate-frequency profile of an ultra-high-precision plane mirror. The measuring device is used to measure the full-aperture intermediate-frequency profile of an ultra-high-precision plane mirror. The device includes: a white light interferometer, a microscopic objective lens, an axial displacement stage, Tilt adjustment table, lifting device, two standard mirrors and autocollimator, computer system and marble base. The white light interferometer is installed on the lifting device on the marble beam; the measuring platform composed of the axial displacement table and the tilt adjustment table is installed on the marble base, and the measurement process is monitored in real time by two vertically installed autocollimator angle measurement systems The space attitude of the ultra-high-precision plane mirror to be measured; the computer system is connected with the white light interferometer to collect the surface shape information of the ultra-high-precision plane mirror aperture area; the inner surface shape information of the next sub-aperture of the ultra-high-precision plane mirror is obtained by adjusting the translation stage, and finally according to the self- The collimator detection data is combined with the splicing data processing software to obtain the full-aperture surface shape error of the ultra-high-precision plane mirror.

Description

technical field [0001] The invention belongs to the technical field of advanced optical manufacturing and detection, and in particular relates to an ultra-high-precision plane mirror full-aperture intermediate-frequency surface shape measuring device and method. Background technique [0002] With the continuous development of modern optics, the application of ultra-high-precision optical components is becoming more and more extensive. In particular, the application of ultra-high-precision flat mirrors has received more and more attention, followed by strict requirements for its detection accuracy and detection frequency band. Modern optics require ultra-high-precision plane mirrors not only for low-frequency surface shape accuracy, but also for intermediate-frequency surface shape information. [0003] Optical interference detection technology is widely used in the field of surface detection as an effective high-precision optical surface detection technology. General optic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/2441
Inventor 张帅侯溪胡小川李佳慧
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com