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High-precision matching method of corresponding points of projector based on epipolar sampling and its application

A matching method and projector technology, applied in the direction of using optical devices, instruments, measuring devices, etc., to achieve the effects of improving measurement accuracy, eliminating matching errors of corresponding points, and improving calibration accuracy

Active Publication Date: 2022-02-18
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

[0005] Aiming at at least one defect or improvement requirement of the prior art, the present invention provides a high-precision matching method for corresponding points of a projector based on epipolar sampling and its application, the purpose of which is to solve the problem of high-precision structured light profilers or phase measurement profilers. Technical problems of system calibration or offline measurement

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  • High-precision matching method of corresponding points of projector based on epipolar sampling and its application
  • High-precision matching method of corresponding points of projector based on epipolar sampling and its application
  • High-precision matching method of corresponding points of projector based on epipolar sampling and its application

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[0038] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0039] The working principle of a high-precision matching method for corresponding points of a projector based on epipolar line sampling provided by the present invention will be described in detail below with reference to the embodiments and the accompanying drawings.

[0040] figure 1It is a schematic diagram of a high-precision matching method for corresponding points of a projector based on...

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Abstract

The invention discloses a high-precision matching method of corresponding points of a projector based on epipolar line sampling and its application, which pre-calibrates the internal and external parameters and distortion models of the camera and projector composed of structured light; in the matching process of corresponding points In , for any de-distorted camera pixel point and its measured phase value, sample and fit the epipolar line of the projector deformed by the distortion, and obtain its corresponding curved epipolar line equation on the imaging surface of the projector; then use Measure the phase value to construct the equiphase line on the imaging surface of the projector, and calculate its intersection with the curved epipolar line, and finally obtain the high-precision projector distortion pixel corresponding to the camera pixel. The de-distortion calculation of the corresponding points of the distortion can be used for high-precision 3D reconstruction or system calibration of the structured light profiler.

Description

technical field [0001] The invention belongs to the technical field of phase measurement contours, and more particularly relates to a high-precision matching method for corresponding points of a projector based on epipolar sampling and its application. Background technique [0002] A fringe projection structured light profiler or a phase measurement profiler is mainly composed of a computer, a camera and a projector. Due to factors such as the manufacturing process and assembly error of the lens, the actual pixel points of the camera or projector on its imaging plane often do not coincide with the ideal pixel points under the pinhole imaging model. The difference between the actual image point and the ideal image point is distortion error. Distortion errors cause systematic errors in 3D surface reconstruction based on optical triangulation. [0003] Due to the asymmetrical arrangement of the projection device relative to the optical axis, the distortion of the projector is...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/2433
Inventor 王健徐龙卢文龙周莉萍
Owner HUAZHONG UNIV OF SCI & TECH
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