Large-numerical-aperture objective lens wave aberration splicing measurement device and measurement method

A numerical aperture and measuring device technology, applied in the field of optical detection, can solve the problems of low energy utilization rate, no efficient, high-precision large numerical aperture objective lens wave aberration measuring device and measuring method, etc., to improve the accuracy of stitching measurement , The measurement numerical aperture can be expanded and the measurement efficiency is high.

Active Publication Date: 2021-06-15
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Application Information

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Problems solved by technology

This method requires a separate secondary calibration of the system error, especially the wave aberration of the collimating objective lens, and in the calibration process, it is necessary to use a spatial filter at the front end of the collimating objective lens to generate a standard spherical wave. The biggest disadvantage of the generation method is the low energy utilization rate
[0005] At present, there is no efficient, high-precision and large numerical aperture objective lens wave aberration measurement device and measurement method

Method used

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  • Large-numerical-aperture objective lens wave aberration splicing measurement device and measurement method
  • Large-numerical-aperture objective lens wave aberration splicing measurement device and measurement method
  • Large-numerical-aperture objective lens wave aberration splicing measurement device and measurement method

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Embodiment 1

[0042] Embodiment 1: The objective lens 7 with a large numerical aperture to be measured is a finite-distance objective lens.

[0043] Such as figure 2 As shown, the wave surface measurement module in this embodiment is composed of a wave surface measuring instrument 1 and a standard lens 2, and the parallel light output by the wave surface measuring instrument 1 is converged by the standard lens 2;

[0044] The rotating mechanism is composed of a tilting platform 4, a rotating platform 6, and a three-dimensional translation platform 5. The standard spherical mirror 3 is installed on the tilting platform 4, and the described tilting platform 4 is fixed on the three-dimensional translation platform 5. The three-dimensional translation platform 5 is fixed on the rotary platform 6 . The turntable 6 performs 360-degree rotation adjustment around the optical axis of the wave surface measuring instrument 1, and the three-dimensional translation table 5 can provide three-dimensiona...

Embodiment 2

[0067] Embodiment 2: The objective lens 7 with a large numerical aperture to be measured is an infinity objective lens.

[0068] In this embodiment, when the wave surface measuring instrument 1 is a Fizeau interferometer, the wave surface measuring module is composed of the wave surface measuring instrument 1 and a standard lens 2, and the standard lens 2 is a plane standard mirror with a reference surface; when the wave surface measuring instrument When 1 is a Tieman interferometer or a Hartmann sensor, the wave surface measurement module only includes wave surface measurement instrument 1. Other than that, other parts and method steps of Embodiment 2 are the same as Embodiment 1.

[0069] Figure 4 It is a schematic diagram of the path planning for the wave aberration stitching measurement of the objective lens with a large numerical aperture. Figure 4 (a) shows the tilt direction and rotation direction of the rotating mechanism, Figure 4 (b) shows a schematic diagram o...

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Abstract

The invention discloses a large-numerical-aperture objective lens wave aberration measurement device and measurement method. The measurement device comprises a wave surface measurement module, a standard spherical reflector and a rotating mechanism capable of providing rotation and inclination adjustment. An objective lens to be measured is arranged between the wave surface measurement module and the standard spherical reflector, and the optical axis of the objective lens coincides with the optical axis of the wave surface measurement module. Wavefront in a full numerical aperture range of the objective lens to be measured is divided into a series of sub-aperture wavefront, the rotating mechanism controls the standard spherical reflector to realize positioning of each sub-aperture, the wave surface measurement module measures sub-aperture data, and the sub-aperture data is subjected to splicing calculation to finally obtain wave aberration information of the objective lens to be measured in the full numerical aperture range. Meanwhile, the splicing measurement precision is improved by calibrating the system error of the wave surface measurement module. The device and the method have the advantages of being good in measurement universality, simple in measurement device and extensible in measurable numerical aperture of the objective lens to be measured, and are particularly suitable for wave aberration measurement of an objective lens with the numerical aperture N.A being 0.9 or above.

Description

technical field [0001] The invention relates to the technical field of optical detection, in particular to a wave aberration measurement device and measurement method based on spliced ​​large numerical aperture objective lenses. Background technique [0002] The numerical aperture of the objective lens is an important factor in determining the resolution of the optical system. According to the Rayleigh formula, High-resolution objective lenses will develop in the direction of increasing numerical aperture. With the improvement of the resolution of the objective optical system, higher requirements are put forward for the aberration control of the objective system. Traditional geometric aberration, optical transfer function and point spread function cannot meet the requirements of aberration description of high-resolution objective optical system, and wave aberration has become a more stringent and mainstream evaluation method for evaluating the imaging quality of high-resol...

Claims

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Application Information

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IPC IPC(8): G01M11/02
CPCG01M11/02G01M11/0207G01M11/0257
Inventor 卢云君唐锋王向朝郭福东
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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