Cooling liquid sputtering prevention device for polymer synthetic new material processing

An anti-sputtering and cooling liquid technology, which is applied in sawing machine devices, metal processing equipment, metal processing machinery parts, etc., can solve the problems of poor protection effect, and achieve the effect of improving stability and good anti-sputtering effect.

Pending Publication Date: 2021-03-02
诸暨伍凯机械有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides a cooling liquid anti-sputtering device for processing new polymer synthetic materials, which has the advantage of good anti-sp...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cooling liquid sputtering prevention device for polymer synthetic new material processing
  • Cooling liquid sputtering prevention device for polymer synthetic new material processing
  • Cooling liquid sputtering prevention device for polymer synthetic new material processing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0024] see Figure 1-5, a cooling liquid anti-sputtering device for processing new polymer synthetic materials, comprising a workbench 1, a clamping mechanism 2 is arranged inside the workbench 1, a support plate-3 is fixedly connected to the back of the workbench 1, and the support plate-1 3. The top of the front is fixedly connected with support plate 2 4, and the right side of the bottom of support plate 2 4 is fixedly connected with cylinder 5. The model o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a cooling liquid sputtering prevention device for polymer synthetic new material processing. The cooling liquid sputtering prevention device for polymer synthetic new materialprocessing comprises a workbench, a clamping mechanism is arranged in the workbench, a first supporting plate is fixedly connected to the back surface of the workbench, a second supporting plate is fixedly connected to the top of the front surface of the first supporting plate, and an air cylinder is fixedly connected to the right side of the bottom of the second supporting plate. According to thecooling liquid sputtering prevention device for polymer synthetic new material processing, an electric box and a protective sleeve are driven by the air cylinder to move downwards, the protective sleeve can protect cooling liquid through a baffle while pressing a metal material through a square spray head, therefore, the advantage of being good in sputtering prevention effect is achieved, and theproblems that a cooling liquid sputtering prevention device of an existing cutting device only protects cooling liquid through a spacer sleeve on a cutting disc, and the protection effect is poor aresolved; and the phenomenon that in the protection process, more cooling liquid still splashes out, and consequently waste is caused is avoided, and use is convenient for people.

Description

technical field [0001] The invention relates to the technical field of processing new polymer synthesis materials, in particular to a cooling liquid anti-sputtering device for processing new polymer synthesis materials. Background technique [0002] Biopolymer material, also known as hydrogen storage material, is a kind of polymer material, which can absorb or release hydrogen in a large amount by certain transition metals, alloys or intermetallic compounds under certain temperature and pressure conditions, and can be used as a biological high molecular weight material. molecular material. [0003] In the process of processing new polymer synthesis materials, cutting devices are required to cut alloys or metals, and cooling liquid is required to spray the cutting disk and metal to cool down during the cutting process. However, the cooling liquid of the existing cutting devices prevents The sputtering device only protects the cooling liquid through the retaining sleeve on th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B23D47/00B23Q11/08B23Q11/10
CPCB23D47/00B23Q11/08B23Q11/10B23Q11/1069
Inventor 许泉江
Owner 诸暨伍凯机械有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products