Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A two-dimensional nanopositioning platform

A positioning platform, two-dimensional nanotechnology, used in instruments, measuring devices, scanning probe microscopy, etc., can solve the problem of difficult to achieve grid scanning speed, achieve high-speed positioning, increase grid scanning frequency, high basic Effect of Resonant Frequency

Active Publication Date: 2022-05-24
HUAZHONG UNIV OF SCI & TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

General image (such as 12 frames per second) scanning, the raster scanning speed of the existing commercial AFM is also difficult to achieve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A two-dimensional nanopositioning platform
  • A two-dimensional nanopositioning platform
  • A two-dimensional nanopositioning platform

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] In order to make the object of the present invention, the technical solution and advantages more clearly understood, the following in conjunction with the accompanying drawings and embodiments, the present invention will be further elaborated in detail. It should be understood that the specific embodiments described herein are merely used to explain the present invention and are not intended to qualify the present invention. Further, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not constitute a conflict with each other.

[0045] Embodiments of the present application provide a two-dimensional nanolocation platform, such as Figure 1As shown, the two-dimensional nano positioning platform includes a motion platform 1 and a platform substrate 2 and a drive device. Wherein, the motion platform 1 is disposed in the center of the upper surface of the platform substrate 2, for ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a two-dimensional nano-positioning platform, belonging to the field of image-level atomic force microscope positioning control, comprising: a platform base, a motion platform and a driving device, the motion platform is set at the center of the platform base, and is used for driving signals Under the action, the displacement movement is carried out on the platform base; the driving device is respectively connected with the platform base and the motion platform, and there are correspondingly connected four-direction drive slots, four-direction drive branch chains, and four-direction connection branch chains. And the transmission branch chain group of four directions. The driving signal output by the driver in the driver slot is output to the transmission branch chain group through the driving branch chain and the connecting branch chain, and drives the motion platform to perform two-dimensional translational motion. The platform of this application is distributed symmetrically around the motion platform, and the transmission branch chains in each direction adopt a three-parallel axis symmetrical branch chain layout, which can effectively reduce coupling errors; the integrated compliant mechanism design has the characteristics of high rigidity and no friction, which can improve the performance of the platform. the natural frequency.

Description

Technical field [0001] The present invention belongs to the field of image-level atomic force microscopy positioning control, more particularly, relates to a two-dimensional nanopositioning platform. Background [0002] In the field of the new generation of information technology industry, a number of precision and high-speed basic manufacturing equipment need to be developed, which clarifies the importance of nano measurement. AFM obtains surface morphology with nanoscale resolution by detecting the interatomic interaction forces between the sample surface and the miniature force-sensitive element. [0003] Since the invention of AFM, its detection technology has been widely used in nanometry, nanoprinting and other industries, and has become one of the main tools for studying biomedical samples and biological macromolecules. Therefore, the development trend of future AFM technology is to achieve high-speed image-level scanning, and high-speed and high-precision nanopositioning ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01Q10/00G01Q60/24
CPCG01Q10/00G01Q60/24
Inventor 张海涛王志岳陈智勇易明磊
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com